Influence of Film Characteristics on the Sputtering Rate of MgO
Summary :
We investigated the relationship between the film characteristics and the sputtering rate of the MgO protecting layer in AC-PDP. As possible elements for determining the sputtering rate, we considered the density, orientation, and surface morphology. With respect to the orientation, we found that the sputtering rate increased for the sequence of (200) < (220) < (111). However, we noticed that orientation and surface structure are not really decisive factors affecting the sputtering rate; the density of the film is most important.
- Publication
- IEICE TRANSACTIONS on Electronics Vol.E82-C No.10 pp.1804-1807
- Publication Date
- 1999/10/25
- Publicized
- Online ISSN
- DOI
- Type of Manuscript
- Special Section PAPER (Special Issue on Electronic Displays)
- Category
Authors
Keyword
MgO, PDP, sputtering, density
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Souichirou HIDAKA, Manabu ISHIMOTO, Nobuhiro IWASE, Keiichi BETSUI, Hiroshi INOUE, "Influence of Film Characteristics on the Sputtering Rate of MgO" in IEICE TRANSACTIONS on Electronics,
vol. E82-C, no. 10, pp. 1804-1807, October 1999, doi: .
Abstract: We investigated the relationship between the film characteristics and the sputtering rate of the MgO protecting layer in AC-PDP. As possible elements for determining the sputtering rate, we considered the density, orientation, and surface morphology. With respect to the orientation, we found that the sputtering rate increased for the sequence of (200) < (220) < (111). However, we noticed that orientation and surface structure are not really decisive factors affecting the sputtering rate; the density of the film is most important.
URL: https://global.ieice.org/en_transactions/electronics/10.1587/e82-c_10_1804/_p
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@ARTICLE{e82-c_10_1804,
author={Souichirou HIDAKA, Manabu ISHIMOTO, Nobuhiro IWASE, Keiichi BETSUI, Hiroshi INOUE, },
journal={IEICE TRANSACTIONS on Electronics},
title={Influence of Film Characteristics on the Sputtering Rate of MgO},
year={1999},
volume={E82-C},
number={10},
pages={1804-1807},
abstract={We investigated the relationship between the film characteristics and the sputtering rate of the MgO protecting layer in AC-PDP. As possible elements for determining the sputtering rate, we considered the density, orientation, and surface morphology. With respect to the orientation, we found that the sputtering rate increased for the sequence of (200) < (220) < (111). However, we noticed that orientation and surface structure are not really decisive factors affecting the sputtering rate; the density of the film is most important.},
keywords={},
doi={},
ISSN={},
month={October},}
Copy
TY - JOUR
TI - Influence of Film Characteristics on the Sputtering Rate of MgO
T2 - IEICE TRANSACTIONS on Electronics
SP - 1804
EP - 1807
AU - Souichirou HIDAKA
AU - Manabu ISHIMOTO
AU - Nobuhiro IWASE
AU - Keiichi BETSUI
AU - Hiroshi INOUE
PY - 1999
DO -
JO - IEICE TRANSACTIONS on Electronics
SN -
VL - E82-C
IS - 10
JA - IEICE TRANSACTIONS on Electronics
Y1 - October 1999
AB - We investigated the relationship between the film characteristics and the sputtering rate of the MgO protecting layer in AC-PDP. As possible elements for determining the sputtering rate, we considered the density, orientation, and surface morphology. With respect to the orientation, we found that the sputtering rate increased for the sequence of (200) < (220) < (111). However, we noticed that orientation and surface structure are not really decisive factors affecting the sputtering rate; the density of the film is most important.
ER -
English
