IEICE TRANSACTIONS on Electronics
METROPOLE-3D: An Efficient and Rigorous 3D Photolithography Simulator
Summary :
In this paper we present a rigorous vector 3D lithography simulator METROPOLE-3D which is designed to run moderately fast on conventional engineering workstations. METROPOLE-3D solves Maxwell's equations rigorously in three dimensions to model how the non-vertically incident light is scattered and transmitted in non-planar structures. METROPOLE-3D consists of several simulation modules: photomask simulator, exposure simulator, post-exposure baking module and 3D development module. This simulator has been applied to a wide range of pressing engineering problems encountered in state-of-the-art VLSI fabrication processes, such as layout printability/manufacturability analysis including reflective notching problems and optimization of an anti-reflective coating (ARC) layer. Finally, a 3D contamination to defect transformation study was successfully performed using our rigorous simulator.
- Publication
- IEICE TRANSACTIONS on Electronics Vol.E82-C No.6 pp.821-829
- Publication Date
- 1999/06/25
- Publicized
- Online ISSN
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- Type of Manuscript
- Special Section INVITED PAPER (Special Issue on TCAD for Semiconductor Industries)
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Andrzej J. STROJWAS, Xiaolei LI, Kevin D. LUCAS, "METROPOLE-3D: An Efficient and Rigorous 3D Photolithography Simulator" in IEICE TRANSACTIONS on Electronics,
vol. E82-C, no. 6, pp. 821-829, June 1999, doi: .
Abstract: In this paper we present a rigorous vector 3D lithography simulator METROPOLE-3D which is designed to run moderately fast on conventional engineering workstations. METROPOLE-3D solves Maxwell's equations rigorously in three dimensions to model how the non-vertically incident light is scattered and transmitted in non-planar structures. METROPOLE-3D consists of several simulation modules: photomask simulator, exposure simulator, post-exposure baking module and 3D development module. This simulator has been applied to a wide range of pressing engineering problems encountered in state-of-the-art VLSI fabrication processes, such as layout printability/manufacturability analysis including reflective notching problems and optimization of an anti-reflective coating (ARC) layer. Finally, a 3D contamination to defect transformation study was successfully performed using our rigorous simulator.
URL: https://global.ieice.org/en_transactions/electronics/10.1587/e82-c_6_821/_p
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@ARTICLE{e82-c_6_821,
author={Andrzej J. STROJWAS, Xiaolei LI, Kevin D. LUCAS, },
journal={IEICE TRANSACTIONS on Electronics},
title={METROPOLE-3D: An Efficient and Rigorous 3D Photolithography Simulator},
year={1999},
volume={E82-C},
number={6},
pages={821-829},
abstract={In this paper we present a rigorous vector 3D lithography simulator METROPOLE-3D which is designed to run moderately fast on conventional engineering workstations. METROPOLE-3D solves Maxwell's equations rigorously in three dimensions to model how the non-vertically incident light is scattered and transmitted in non-planar structures. METROPOLE-3D consists of several simulation modules: photomask simulator, exposure simulator, post-exposure baking module and 3D development module. This simulator has been applied to a wide range of pressing engineering problems encountered in state-of-the-art VLSI fabrication processes, such as layout printability/manufacturability analysis including reflective notching problems and optimization of an anti-reflective coating (ARC) layer. Finally, a 3D contamination to defect transformation study was successfully performed using our rigorous simulator.},
keywords={},
doi={},
ISSN={},
month={June},}
Copy
TY - JOUR
TI - METROPOLE-3D: An Efficient and Rigorous 3D Photolithography Simulator
T2 - IEICE TRANSACTIONS on Electronics
SP - 821
EP - 829
AU - Andrzej J. STROJWAS
AU - Xiaolei LI
AU - Kevin D. LUCAS
PY - 1999
DO -
JO - IEICE TRANSACTIONS on Electronics
SN -
VL - E82-C
IS - 6
JA - IEICE TRANSACTIONS on Electronics
Y1 - June 1999
AB - In this paper we present a rigorous vector 3D lithography simulator METROPOLE-3D which is designed to run moderately fast on conventional engineering workstations. METROPOLE-3D solves Maxwell's equations rigorously in three dimensions to model how the non-vertically incident light is scattered and transmitted in non-planar structures. METROPOLE-3D consists of several simulation modules: photomask simulator, exposure simulator, post-exposure baking module and 3D development module. This simulator has been applied to a wide range of pressing engineering problems encountered in state-of-the-art VLSI fabrication processes, such as layout printability/manufacturability analysis including reflective notching problems and optimization of an anti-reflective coating (ARC) layer. Finally, a 3D contamination to defect transformation study was successfully performed using our rigorous simulator.
ER -
English
