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Mesh Generation for Application in Technology CAD

Peter FLEISCHMANN, Wolfgang PYKA, Siegfried SELBERHERR

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Summary :

After a brief discussion of the demands in meshing for semiconductor process and device simulation, we present a three-dimensional Delaunay refinement technique combined with a modified advancing front algorithm.

Publication
IEICE TRANSACTIONS on Electronics Vol.E82-C No.6 pp.937-947
Publication Date
1999/06/25
Publicized
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DOI
Type of Manuscript
Special Section INVITED PAPER (Special Issue on TCAD for Semiconductor Industries)
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