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IEICE TRANSACTIONS on Electronics

Magnetic and Electric Properties of Fe3O4 Thin Films Sputtered on Metallic Underlayer

Fei QIN, Yukio NOZAKI, Kimihide MATSUYAMA

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Summary :

High-quality Fe3O4 thin films have been fabricated onto metallic underlayers of Cr/Cu and Al by rf-magnetron sputtering at low substrate temperatures (<573 K). The measured saturation magnetizations Ms are 462 emu/cm3 for Al (50 nm)/Fe3O4 (200 nm) and 422 emu/cm3 for Cr (45 nm)/Cu (300 nm)/Fe3O4 (200 nm), which are markedly enhanced compared with that for the reference sample deposited directly on a glass substrate, and practically comparable to the bulk value of 477 emu/cm3. Highly conductive transport with an order-disorder change of the Verwey transition was observed in the current-perpendicular-to-plane geometry. The order of decrease in coercive field was achieved by exchange coupling with an overlaid NiFe layer.

Publication
IEICE TRANSACTIONS on Electronics Vol.E87-C No.2 pp.189-192
Publication Date
2004/02/01
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DOI
Type of Manuscript
Special Section PAPER (Special Section on Recent Progress in Oxide Thin Films by Sputtering)
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