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Possibility of Metal-Oxide-Nitride-Oxide-Semiconductor Memories for Long Lifespan Archive Memories

Hiroki SHIRAKAWA, Keita YAMAGUCHI, Masaaki ARAIDAI, Katsumasa KAMIYA, Kenji SHIRAISHI

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Summary :

We demonstrate on the basis of ab initio calculations that metal-oxide-nitride-oxide-semiconductor (MONOS) memory is one of the most promising future high-density archive memories. We find that O related defects in a MONOS memory cause irreversible structural changes to the SiO2/Si3N4 interface at the atomistic level during program/erase (P/E) cycles. Carrier injection during the programming operation makes the structure energetically very stable, because all the O atoms in this structure take on three-fold-coordination. The estimated lifespan of the programmed state is of the order of a thousand years.

Publication
IEICE TRANSACTIONS on Electronics Vol.E100-C No.10 pp.928-933
Publication Date
2017/10/01
Publicized
Online ISSN
1745-1353
DOI
10.1587/transele.E100.C.928
Type of Manuscript
PAPER
Category
Semiconductor Materials and Devices

Authors

Hiroki SHIRAKAWA
  Nagoya University
Keita YAMAGUCHI
  Nagoya University
Masaaki ARAIDAI
  Nagoya University
Katsumasa KAMIYA
  Kanagawa Institute of Technology
Kenji SHIRAISHI
  Nagoya University

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