IEICE TRANSACTIONS on Electronics
Low-Temperature Polycrystalline-Silicon Thin-Film Transistors Fabricated by Continuous-Wave Laser Lateral Crystallization and Metal/Hafnium Oxide Gate Stack on Nonalkaline Glass Substrate
Summary :
Enhancing the performance of low-temperature (LT) polycrystalline-silicon (poly-Si) thin-film transistors (TFTs) requires high-quality poly-Si films. One of the authors (A.H.) has already demonstrated a continuous-wave (CW) laser lateral crystallization (CLC) method to improve the crystalline quality of thin poly-Si films, using a diode-pumped solid-state CW laser. Another candidate method to increase the on-current and decrease the subthreshold swing (s.s.) is the use of a high-k gate stack. In this paper, we discuss the performance of top-gate CLC LT poly-Si TFTs with sputtering metal/hafnium oxide (HfO2) gate stacks on nonalkaline glass substrates. A mobility of 180 cm2/Vs is obtained for n-ch TFTs, which is considerably higher than those of previously reported n-ch LT poly-Si TFTs with high-k gate stacks; it is, however, lower than the one obtained with a plasma enhanced chemical vapor deposited SiO2 gate stack. For p-ch TFTs, a mobility of 92 cm2/Vs and an s.s. of 98 mV/dec were obtained. This s.s. value is smaller than the ones of the previously reported p-ch LT poly-Si TFTs with high-k gate stacks. The evaluation of a fabricated complementary metal-oxide-semiconductor inverter showed a switching threshold voltage of 0.8 V and a gain of 38 at an input voltage of 2.0 V; moreover, full swing inverter operation was successfully confirmed at the low input voltage of 1.0 V. This shows the feasibility of CLC LT poly-Si TFTs with a sputtered HfO2 gate dielectric on nonalkaline glass substrates.
- Publication
- IEICE TRANSACTIONS on Electronics Vol.E100-C No.1 pp.94-100
- Publication Date
- 2017/01/01
- Publicized
- Online ISSN
- 1745-1353
- DOI
- 10.1587/transele.E100.C.94
- Type of Manuscript
- PAPER
- Category
- Semiconductor Materials and Devices
Authors
Tatsuya MEGURO
Tohoku Gakuin University
Akito HARA
Tohoku Gakuin University
Keyword
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Tatsuya MEGURO, Akito HARA, "Low-Temperature Polycrystalline-Silicon Thin-Film Transistors Fabricated by Continuous-Wave Laser Lateral Crystallization and Metal/Hafnium Oxide Gate Stack on Nonalkaline Glass Substrate" in IEICE TRANSACTIONS on Electronics,
vol. E100-C, no. 1, pp. 94-100, January 2017, doi: 10.1587/transele.E100.C.94.
Abstract: Enhancing the performance of low-temperature (LT) polycrystalline-silicon (poly-Si) thin-film transistors (TFTs) requires high-quality poly-Si films. One of the authors (A.H.) has already demonstrated a continuous-wave (CW) laser lateral crystallization (CLC) method to improve the crystalline quality of thin poly-Si films, using a diode-pumped solid-state CW laser. Another candidate method to increase the on-current and decrease the subthreshold swing (s.s.) is the use of a high-k gate stack. In this paper, we discuss the performance of top-gate CLC LT poly-Si TFTs with sputtering metal/hafnium oxide (HfO2) gate stacks on nonalkaline glass substrates. A mobility of 180 cm2/Vs is obtained for n-ch TFTs, which is considerably higher than those of previously reported n-ch LT poly-Si TFTs with high-k gate stacks; it is, however, lower than the one obtained with a plasma enhanced chemical vapor deposited SiO2 gate stack. For p-ch TFTs, a mobility of 92 cm2/Vs and an s.s. of 98 mV/dec were obtained. This s.s. value is smaller than the ones of the previously reported p-ch LT poly-Si TFTs with high-k gate stacks. The evaluation of a fabricated complementary metal-oxide-semiconductor inverter showed a switching threshold voltage of 0.8 V and a gain of 38 at an input voltage of 2.0 V; moreover, full swing inverter operation was successfully confirmed at the low input voltage of 1.0 V. This shows the feasibility of CLC LT poly-Si TFTs with a sputtered HfO2 gate dielectric on nonalkaline glass substrates.
URL: https://global.ieice.org/en_transactions/electronics/10.1587/transele.E100.C.94/_p
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@ARTICLE{e100-c_1_94,
author={Tatsuya MEGURO, Akito HARA, },
journal={IEICE TRANSACTIONS on Electronics},
title={Low-Temperature Polycrystalline-Silicon Thin-Film Transistors Fabricated by Continuous-Wave Laser Lateral Crystallization and Metal/Hafnium Oxide Gate Stack on Nonalkaline Glass Substrate},
year={2017},
volume={E100-C},
number={1},
pages={94-100},
abstract={Enhancing the performance of low-temperature (LT) polycrystalline-silicon (poly-Si) thin-film transistors (TFTs) requires high-quality poly-Si films. One of the authors (A.H.) has already demonstrated a continuous-wave (CW) laser lateral crystallization (CLC) method to improve the crystalline quality of thin poly-Si films, using a diode-pumped solid-state CW laser. Another candidate method to increase the on-current and decrease the subthreshold swing (s.s.) is the use of a high-k gate stack. In this paper, we discuss the performance of top-gate CLC LT poly-Si TFTs with sputtering metal/hafnium oxide (HfO2) gate stacks on nonalkaline glass substrates. A mobility of 180 cm2/Vs is obtained for n-ch TFTs, which is considerably higher than those of previously reported n-ch LT poly-Si TFTs with high-k gate stacks; it is, however, lower than the one obtained with a plasma enhanced chemical vapor deposited SiO2 gate stack. For p-ch TFTs, a mobility of 92 cm2/Vs and an s.s. of 98 mV/dec were obtained. This s.s. value is smaller than the ones of the previously reported p-ch LT poly-Si TFTs with high-k gate stacks. The evaluation of a fabricated complementary metal-oxide-semiconductor inverter showed a switching threshold voltage of 0.8 V and a gain of 38 at an input voltage of 2.0 V; moreover, full swing inverter operation was successfully confirmed at the low input voltage of 1.0 V. This shows the feasibility of CLC LT poly-Si TFTs with a sputtered HfO2 gate dielectric on nonalkaline glass substrates.},
keywords={},
doi={10.1587/transele.E100.C.94},
ISSN={1745-1353},
month={January},}
Copy
TY - JOUR
TI - Low-Temperature Polycrystalline-Silicon Thin-Film Transistors Fabricated by Continuous-Wave Laser Lateral Crystallization and Metal/Hafnium Oxide Gate Stack on Nonalkaline Glass Substrate
T2 - IEICE TRANSACTIONS on Electronics
SP - 94
EP - 100
AU - Tatsuya MEGURO
AU - Akito HARA
PY - 2017
DO - 10.1587/transele.E100.C.94
JO - IEICE TRANSACTIONS on Electronics
SN - 1745-1353
VL - E100-C
IS - 1
JA - IEICE TRANSACTIONS on Electronics
Y1 - January 2017
AB - Enhancing the performance of low-temperature (LT) polycrystalline-silicon (poly-Si) thin-film transistors (TFTs) requires high-quality poly-Si films. One of the authors (A.H.) has already demonstrated a continuous-wave (CW) laser lateral crystallization (CLC) method to improve the crystalline quality of thin poly-Si films, using a diode-pumped solid-state CW laser. Another candidate method to increase the on-current and decrease the subthreshold swing (s.s.) is the use of a high-k gate stack. In this paper, we discuss the performance of top-gate CLC LT poly-Si TFTs with sputtering metal/hafnium oxide (HfO2) gate stacks on nonalkaline glass substrates. A mobility of 180 cm2/Vs is obtained for n-ch TFTs, which is considerably higher than those of previously reported n-ch LT poly-Si TFTs with high-k gate stacks; it is, however, lower than the one obtained with a plasma enhanced chemical vapor deposited SiO2 gate stack. For p-ch TFTs, a mobility of 92 cm2/Vs and an s.s. of 98 mV/dec were obtained. This s.s. value is smaller than the ones of the previously reported p-ch LT poly-Si TFTs with high-k gate stacks. The evaluation of a fabricated complementary metal-oxide-semiconductor inverter showed a switching threshold voltage of 0.8 V and a gain of 38 at an input voltage of 2.0 V; moreover, full swing inverter operation was successfully confirmed at the low input voltage of 1.0 V. This shows the feasibility of CLC LT poly-Si TFTs with a sputtered HfO2 gate dielectric on nonalkaline glass substrates.
ER -
English
