The search functionality is under construction.
The search functionality is under construction.

Open Access
Room-Temperature Gold-Gold Bonding Method Based on Argon and Hydrogen Gas Mixture Atmospheric-Pressure Plasma Treatment for Optoelectronic Device Integration

Eiji HIGURASHI, Michitaka YAMAMOTO, Takeshi SATO, Tadatomo SUGA, Renshi SAWADA

  • Full Text Views

    90

  • Cite this
  • Free PDF (1.3MB)

Summary :

Low-temperature bonding methods of optoelectronic chips, such as laser diodes (LD) and photodiode (PD) chips, have been the focus of much interest to develop highly functional and compact optoelectronic devices, such as microsensors and communication modules. In this paper, room-temperature bonding of the optoelectronic chips with Au thin film to coined Au stud bumps with smooth surfaces (Ra: 1.3nm) using argon and hydrogen gas mixture atmospheric-pressure plasma was demonstrated in ambient air. The die-shear strength was high enough to exceed the strength requirement of MIL-STD-883F, method 2019 (×2). The measured results of the light-current-voltage characteristics of the LD chips and the dark current-voltage characteristics of the PD chips indicated no degradation after bonding.

Publication
IEICE TRANSACTIONS on Electronics Vol.E99-C No.3 pp.339-345
Publication Date
2016/03/01
Publicized
Online ISSN
1745-1353
DOI
10.1587/transele.E99.C.339
Type of Manuscript
Special Section INVITED PAPER (Special Section on Progress towards System Nanotechnology)
Category

Authors

Eiji HIGURASHI
  The University of Tokyo
Michitaka YAMAMOTO
  The University of Tokyo
Takeshi SATO
  The University of Tokyo
Tadatomo SUGA
  The University of Tokyo
Renshi SAWADA
  Kyushu University

Keyword