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IEICE TRANSACTIONS on transactions

Precise Control of Grating Pitch by Electron-Beam Exposure System for Integrated Optics

Kazuhito FURUYA, Kenji YOSHIDA, Kimiyasu HONJO, Yasuharu SUEMATSU

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Summary :

A pitch of a grating drawn by an electron beam was controlled precisely within 10 by attaching an attenuator to a conventional electron-beam-exposure system. This technique may be applied for fabrication of a periodic structure for integrated optics.

Publication
IEICE TRANSACTIONS on transactions Vol.E66-E No.9 pp.561-562
Publication Date
1983/09/25
Publicized
Online ISSN
DOI
Type of Manuscript
LETTER
Category
Optical and Quantum Electronics

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