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Josephson Tunneling Junctions with High Tc Nb3 (Ge, Si) Lower Electrode

Norio TERADA, Masahiko NAOE

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Summary :

Nb3 (Ge, Si)/a-Si oxide/Pb junctions have been fabricated and their I-V characteristics have been investigated. Δsum gap, Rsub gap/RNN and IcRNN take excellent values of 4.7 mV, 18 and 4 mV, respectively, by oxidizing surface layer of a-Si before exposure to air until barrier thickness becomes 2025 .

Publication
IEICE TRANSACTIONS on transactions Vol.E68-E No.5 pp.343-344
Publication Date
1985/05/25
Publicized
Online ISSN
DOI
Type of Manuscript
LETTER
Category
Electron Devices

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