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Tae Il BAE Jin Wook KIM Young Hwan KIM
As the semiconductor feature size decreases, the crosstalk due to the capacitive coupling of interconnects influences signal propagation delay more seriously. Moreover, the increase of the operating frequency further emphasizes the necessity of more accurate timing analysis. In this paper, we propose new gate models to calculate gate output waveforms under crosstalk effects, which can be used for gate-level delay estimation. We classify the operation modes of metal-oxide-semiconductor (MOS) devices of a gate into 3 regions, and then develop simple linear models for each region. In addition, we present a non-iterative gate modeling method that is more efficient than previous iterative methods. In the experiments, the proposed method exhibits a maximum error of 10.70% and an average error of 2.63% when it computes the 50% delays of two or three complementary MOS (CMOS) inverters driving parallel wires. In comparison, the existing method has a maximum error of 25.94% and an average error of 3.62% under these conditions.
Hong Bo CHE Jin Wook KIM Tae Il BAE Young Hwan KIM
A new acceleration scheme that decreases the number of required iterations in relaxation methodology is proposed. The proposed scheme uses dynamic error prediction of an improved approximation to the solution during an iterative computation. The proposed scheme's application to circuit simulations required an average of 67.3% fewer iterations compared to un-accelerated relaxation methods.