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Kimio UEDA Yoshiki WADA Takanori HIROTA Shigenobu MAEDA Koichiro MASHIKO Hisanori HAMANO
This paper discusses the features of SOI/CMOS circuits in comparison with bulk/CMOS circuits. We have to design circuits with small fan outs and short wires to take advantage of high-speed and low-power SOI/CMOS devices to their fullest. We can take advantage of the SOI/CMOS structure if the ratio of the source/drain capacitances to the gate capacitances is much greater in the load capacitance. Thus, we propose a new flip-flop circuit with a smaller gate capacitance. The flip-flop circuit operates 30% faster than the previous circuit at 2.0 V. We also propose a buffer circuit having less delay disparity between the complementary output signals. The buffer circuit has the delay disparity of 18 ps at 0.2 pF and 2.0 V. We fabricated an 8-bit frequency divider and a 4-bit demultiplexer using the proposed circuits and 0.35 µm SOI/CMOS process. The 8-bit frequency divider and the 4-bit demultiplexer operate at 2.8 GHz and 1.6 GHz, respectively, at 2.0 V.
Kimio UEDA Koji NII Yoshiki WADA Shigenobu MAEDA Toshiaki IWAMATSU Yasuo YAMAGUCHI Takashi IPPOSHI Shigeto MAEGAWA Koichiro MASHIKO Yasutaka HORIBA
This paper describes a 0.35µm SOI-CMOS gate array using partially-depleted transistors. The gate array adopts the field-shield isolation technique with body-tied structures to suppress floating-body problems such as: (1) kink characteristics in drain currents, (2) low break-down voltage, and (3) frequency-dependent delay time. By optimizing the basic-cell layout and power-line wiring, the SOI-CMOS gate array also allows the use of the cell libraries and the design methodologies compatible with bulk-CMOS gate arrays. An ATM (Asynchronous Transfer Mode) physical-layer processing LSI was fabricated using a 0.35µm SOI-CMOS gate array with 560k raw gates. The LSI operated at 156 Mbps at 2.0 V, while consuming 71% less power than using a typical 0.35µm 3.3 V bulk-CMOS gate array.
Koichiro MASHIKO Kimio UEDA Tsutomu YOSHIMURA Takanori HIROTA Yoshiki WADA Jun TAKASOH Kazuo KUBO
Based on the partially-depleted, thin-film SOI/CMOS technology, the influence of reduced junction capacitance on the performance of the elementary gates and large scale gate array chip is reviewed. To further reduce the power consumption, SOI-specific device configurations, in which the body-bias is individually controlled, are effective in lowering the supply voltage and hence the power consumption while keeping the circuit speed. Two attempts are introduced: (1) DTMOS (Dynamic-Threshold MOS)/SOI to achieve ultra low-voltage and yet high-speed operation, and (2) ABB (Active-Body-Bias) MOS to enhance the current drive under the low supply voltage.