We considered the oxygen diffusivity around a conductive filament of resistive switching oxides, with the aim of designing material appropriate for highly reliable non-volatile memory. Both theoretical and experimental analyses were performed for this consideration. The theoretically obtained oxygen chemical potential difference, which works as a driving force for diffusion, significantly depends on a material. Then, we experimentally confirmed that the oxygen diffusion behaviors vary greatly depending on the chemical potential differences.

Due to the aggressive scaling of non-volatile memories, “charge-trap memories” such as MONOS-type memories become one of the most important targets. One of the merits of such MONOS-type memories is that they can trap charges inside atomic-scale defect sites in SiN layers. At the same time, however, charge traps with atomistic scale tend to induce additional large structural changes. Hydrogen has attracted a great attention as an important heteroatom in MONOS-type memories. We theoretically investigate the basic characteristics of hydrogen-defects in SiN layer in MONOS-type memories on the basis of the first-principles calculations. We find that SiN structures with a hydrogen impurity tend to reveal reversible structural change during program/erase operation.