We fabricated Fe-silicide nanodots (NDs) on an ultrathin SiO2 layer and evaluated changes in electron transport properties with and without magnetic field application. High-density NDs with an areal density as high as ∼1011cm-2 were formed on thermally grown SiO2 by exposing ultrathin Fe/Si-NDs structures to a remote H2 plasma without external heating. In electron transport properties related to current-time characteristics for a diode with Fe electrode and charging energy to NDs, clear changes in current levels through NDs and electron injection modulation of NDs depending on intensity of magnetic fields were observed.

We have studied the formation of Pd-nanodots on SiO2 from ultrathin Pd films being exposed to remote hydrogen plasma at room temperature, in which parameters such as the gas pressure and input power to generate H2 plasma and the Pd film thickness were selected to get some insights into surface migration of Pd atoms induced with atomic hydrogen irradiation and resultant agglomeration with cohesive action. The areal dot density was controlled in the range from 3.4 to 6.51011 cm - 2 while the dot size distribution was changed from 7 to 1.5 in average dot height with 40% variation in full-width at half maximum. We also fabricated MOS capacitors with a Pd-nanodots floating gate and confirmed the flat-band voltage shift in capacitance-voltage characteristic due to electron injection to and emission from the dots floating gate.