This paper presents Super-CMOS SRAM process technology that integrates bipolar and CMOS transistors in a chip while adding only one ion implantation step and no lithography mask steps to the conventional CMOS SRAM process. The Super-CMOS SRAM process therefore has the same process cost as the CMOS SRAMs, while it achieves higher access speeds. In order to demonstrate the Super-CMOS SRAM, we have developed a 3.3 V/5 V 256 kb SRAM using 0.4 µm Super-CMOS process technology. By applying bipolar transistors to the sense amplifier circuits, a high-speed access time of 5.8 ns with a 3.0 V power supply is successfully achieved.