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Graphene has been expected as an alternative material for copper interconnects in which resistance increases and reliability deteriorates in nanoscale. While the principle advantages are verified by simulations and experiments, they have not been put into practical use due to the immaturity of the manufacturing process leading to mass production. On the other hand, recent steady progress in the fabrication process has increased the possibility of practical application. In this paper, I will review the recent advances and the latest prospects for conductor applications of graphene centered on interconnects. The possibility of further application utilizing the unique characteristics of graphene is discussed.
Hironao SANO Ryota ISHIDA Tatsuya KURA Shunsuke FUJITA Shigeki NAKA Hiroyuki OKADA Takeshi TAKAI
Transparent organic light-emitting diodes (TOLEDs) were investigated with top electrode of indium-tin-oxide (ITO) by ion-plating method. High deposition rate of 4.4 nm/s was realized without plasma damage of under organic layer. In the TOLEDs with inverted structure, high transmittance of over 75% at 550 nm and bright emission of 1,850 and 1,410 cd/m2, from bottom and top side at 163 mA/cm2, respectively, were obtained.