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LATID (Large-Angle-Tilt Implanted Drain) FETs with Buried n- Profile for Deep-Submicron ULSIs

Junji HIRASE, Takashi HORI, Yoshinori ODAKE

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Summary :

This paper proposes a buried-LATID structure featuring a peaked vertical profile around gate edge for the n- drain unlike the reported conventional LATID structure. As compared to the conventional LATID FETs, the deep-submicron buried-LATID FETs achieve improved circuit speed by 7% (50% compared to LDD FETs) due to suppressed gate-to-drain capacitance and improved lifetime by 10 times (300 times compared to LDD FETs). The buried-LATID FETs are very promising for deep-submicron MOSFETs to achieve improved performance and hot-carrier reliability at the same time.

Publication
IEICE TRANSACTIONS on Electronics Vol.E77-C No.3 pp.350-354
Publication Date
1994/03/25
Publicized
Online ISSN
DOI
Type of Manuscript
Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category
Device Technology

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