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IEICE TRANSACTIONS on Electronics

Low-Power and High-Speed LSIs Using 0.25-µm CMOS/SIMOX

Masayuki INO

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Summary :

Various high-performance SOI CMOS circuits were fabricated using fully-depleted 0.25-µm gate MOSFETs on a low-dose SIMOX substrate. 2.4-Gbps operations were achieved for I/O and speed conversion circuits which are key elements in a multimedia communication LSI. LVTTL-compatible gate array LSI was developed with an ESD protection circuit which is the first one to meer the MIL standard. A 120-kG test LSI was fabricated on the gate array, and the LSI performances using three kind of technologies; 0.25-µm bulk and SIMOX and 0.5-µm bulk; were compared. A 0.25-µm SIMOX LSI was 10% faster with 35% less power dissipation compared with a 0.25-µm bulk LSI. The 0.25-µm SIMOX LSI can operate at a VDD of 1.2 V to attain the same speed as the 0.5-µm bulk LSI operating at 3.3 V, and this results in 1/40 power reduction. For the high-speed communication use, an ATM-switch LSI with 220-kG and a 110-kb memory was fabricated. A high-performance of 2.5-Gbps interface speed and 312-Mbps internal speed were achieved using 0.25-µm CMOS/SIMOX. This ATM-switch LSI has the greatest bandwidth of 40-Gbps ever reported using a one-chip ATM-switch LSI.

Publication
IEICE TRANSACTIONS on Electronics Vol.E80-C No.12 pp.1532-1538
Publication Date
1997/12/25
Publicized
Online ISSN
DOI
Type of Manuscript
Special Section INVITED PAPER (Special Issue on Low-Power and High-Speed LSI Technologies)
Category

Authors

Keyword

CMOS,  SOI,  SIMOX,  gate array,  ATM switch