IEICE TRANSACTIONS on Electronics
Design and Development of 3-Dimensional Process Simulator
Summary :
Design concepts and backgrounds of a 3-dimensional semiconductor process simulator are presented. It is designed to become a basis of developing semiconductor process models. An input language is designed to realize flexibly controlling simulation sequence, and its interpreter program is designed to accept external software to be controlled and to be integrated into a system. To realize data-exchanges between the process simulator and other software, a self-describing data-file format is designed and related program libraries are developed. A C++ class for solving drift-diffusion type partial-differential-equation in a three-dimensional space is developed.
- Publication
- IEICE TRANSACTIONS on Electronics Vol.E82-C No.6 pp.839-847
- Publication Date
- 1999/06/25
- Publicized
- Online ISSN
- DOI
- Type of Manuscript
- Special Section INVITED PAPER (Special Issue on TCAD for Semiconductor Industries)
- Category
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Tetsunori WADA, Norihiko KOTANI, "Design and Development of 3-Dimensional Process Simulator" in IEICE TRANSACTIONS on Electronics,
vol. E82-C, no. 6, pp. 839-847, June 1999, doi: .
Abstract: Design concepts and backgrounds of a 3-dimensional semiconductor process simulator are presented. It is designed to become a basis of developing semiconductor process models. An input language is designed to realize flexibly controlling simulation sequence, and its interpreter program is designed to accept external software to be controlled and to be integrated into a system. To realize data-exchanges between the process simulator and other software, a self-describing data-file format is designed and related program libraries are developed. A C++ class for solving drift-diffusion type partial-differential-equation in a three-dimensional space is developed.
URL: https://global.ieice.org/en_transactions/electronics/10.1587/e82-c_6_839/_p
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@ARTICLE{e82-c_6_839,
author={Tetsunori WADA, Norihiko KOTANI, },
journal={IEICE TRANSACTIONS on Electronics},
title={Design and Development of 3-Dimensional Process Simulator},
year={1999},
volume={E82-C},
number={6},
pages={839-847},
abstract={Design concepts and backgrounds of a 3-dimensional semiconductor process simulator are presented. It is designed to become a basis of developing semiconductor process models. An input language is designed to realize flexibly controlling simulation sequence, and its interpreter program is designed to accept external software to be controlled and to be integrated into a system. To realize data-exchanges between the process simulator and other software, a self-describing data-file format is designed and related program libraries are developed. A C++ class for solving drift-diffusion type partial-differential-equation in a three-dimensional space is developed.},
keywords={},
doi={},
ISSN={},
month={June},}
Copy
TY - JOUR
TI - Design and Development of 3-Dimensional Process Simulator
T2 - IEICE TRANSACTIONS on Electronics
SP - 839
EP - 847
AU - Tetsunori WADA
AU - Norihiko KOTANI
PY - 1999
DO -
JO - IEICE TRANSACTIONS on Electronics
SN -
VL - E82-C
IS - 6
JA - IEICE TRANSACTIONS on Electronics
Y1 - June 1999
AB - Design concepts and backgrounds of a 3-dimensional semiconductor process simulator are presented. It is designed to become a basis of developing semiconductor process models. An input language is designed to realize flexibly controlling simulation sequence, and its interpreter program is designed to accept external software to be controlled and to be integrated into a system. To realize data-exchanges between the process simulator and other software, a self-describing data-file format is designed and related program libraries are developed. A C++ class for solving drift-diffusion type partial-differential-equation in a three-dimensional space is developed.
ER -
English
