We show measurement results of variation-tolerance of an error-hardened dual-modular-redundancy flip-flop fabricated in a 65-nm process. The proposed error-hardened FF called BCDMR is very strong against soft errors and also robust to process variations. We propose a shift-register-based test structure to measure variations. The proposed test structure has features of constant pin count and fast measurement time. A 65 nm chip was fabricated including 40k FFs to measure variations. The variations of the proposed BCDMR FF are 74% and 55% smaller than those of the conventional BISER FF on the twin-well and triple-well structures respectively.
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Chikara HAMANAKA, Ryosuke YAMAMOTO, Jun FURUTA, Kanto KUBOTA, Kazutoshi KOBAYASHI, Hidetoshi ONODERA, "Variation-Tolerance of a 65-nm Error-Hardened Dual-Modular-Redundancy Flip-Flop Measured by Shift-Register-Based Monitor Structures" in IEICE TRANSACTIONS on Fundamentals,
vol. E94-A, no. 12, pp. 2669-2675, December 2011, doi: 10.1587/transfun.E94.A.2669.
Abstract: We show measurement results of variation-tolerance of an error-hardened dual-modular-redundancy flip-flop fabricated in a 65-nm process. The proposed error-hardened FF called BCDMR is very strong against soft errors and also robust to process variations. We propose a shift-register-based test structure to measure variations. The proposed test structure has features of constant pin count and fast measurement time. A 65 nm chip was fabricated including 40k FFs to measure variations. The variations of the proposed BCDMR FF are 74% and 55% smaller than those of the conventional BISER FF on the twin-well and triple-well structures respectively.
URL: https://global.ieice.org/en_transactions/fundamentals/10.1587/transfun.E94.A.2669/_p
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@ARTICLE{e94-a_12_2669,
author={Chikara HAMANAKA, Ryosuke YAMAMOTO, Jun FURUTA, Kanto KUBOTA, Kazutoshi KOBAYASHI, Hidetoshi ONODERA, },
journal={IEICE TRANSACTIONS on Fundamentals},
title={Variation-Tolerance of a 65-nm Error-Hardened Dual-Modular-Redundancy Flip-Flop Measured by Shift-Register-Based Monitor Structures},
year={2011},
volume={E94-A},
number={12},
pages={2669-2675},
abstract={We show measurement results of variation-tolerance of an error-hardened dual-modular-redundancy flip-flop fabricated in a 65-nm process. The proposed error-hardened FF called BCDMR is very strong against soft errors and also robust to process variations. We propose a shift-register-based test structure to measure variations. The proposed test structure has features of constant pin count and fast measurement time. A 65 nm chip was fabricated including 40k FFs to measure variations. The variations of the proposed BCDMR FF are 74% and 55% smaller than those of the conventional BISER FF on the twin-well and triple-well structures respectively.},
keywords={},
doi={10.1587/transfun.E94.A.2669},
ISSN={1745-1337},
month={December},}
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TY - JOUR
TI - Variation-Tolerance of a 65-nm Error-Hardened Dual-Modular-Redundancy Flip-Flop Measured by Shift-Register-Based Monitor Structures
T2 - IEICE TRANSACTIONS on Fundamentals
SP - 2669
EP - 2675
AU - Chikara HAMANAKA
AU - Ryosuke YAMAMOTO
AU - Jun FURUTA
AU - Kanto KUBOTA
AU - Kazutoshi KOBAYASHI
AU - Hidetoshi ONODERA
PY - 2011
DO - 10.1587/transfun.E94.A.2669
JO - IEICE TRANSACTIONS on Fundamentals
SN - 1745-1337
VL - E94-A
IS - 12
JA - IEICE TRANSACTIONS on Fundamentals
Y1 - December 2011
AB - We show measurement results of variation-tolerance of an error-hardened dual-modular-redundancy flip-flop fabricated in a 65-nm process. The proposed error-hardened FF called BCDMR is very strong against soft errors and also robust to process variations. We propose a shift-register-based test structure to measure variations. The proposed test structure has features of constant pin count and fast measurement time. A 65 nm chip was fabricated including 40k FFs to measure variations. The variations of the proposed BCDMR FF are 74% and 55% smaller than those of the conventional BISER FF on the twin-well and triple-well structures respectively.
ER -