The lithography process on the deep trench pattern above the large cavity is proposed to fabricate the MEMS structure. Generally, bubbles generated on the trench patterns when it was baked after coating resist. The probability of the generation of bubbles was reduced by decreasing the backing rate. The fast scanning micromirror with 50.8 kHz resonant frequency was fabricated by controlling the backing rate.

The relation between resonant frequency of micromirror with vertical combdrives and applied voltage between the upper and lower comb teeth was analyzed. Resonant frequency of the micromirror was controlled by stiffness of the torsion hinge. Resonant frequency of the mirror was proportional to the applied voltage between the upper and lower comb teeth at the same tilt angle.