This paper describes the behavior of voids that were formed due to electromigration and diffusion in the interconnections of gold during a DC bias tests of GaAs ICs to current densities in the interconnections of 0.67 106 A/cm2 to 1.27 106 A/cm2 in the high temperature range of 230 to 260. We have found that the voids were formed at the centers in the cross sections of the interconnections and that gold is left around the voids, which means current still flows after the void formation. We have carefully observed the movement of the anode and cathode side edge of the voids during the tests and found that edges moved toward the cathode, in the direction opposite to the electron flow. This direction is constant. Also, the voids are extended, which means that the velocity of the cathode side edge is greater than that of the anode side edge. The velocity of the edges almost proportionally increased with the current density. The constant edge movement direction and the velocity of the edge dependence on the current density suggest that one of the causes of the edge movement is electromigration. The velocity of the edge depends on the distance between the anode side edge of the void and the through hole. The velocity increases in accordance with a decrease in the distance. This means that one of the causes of the edge movement is the diffusion of gold atoms by a concentration and pressure gradient. The GaAs IC failed at almost the same time as the voids appeared. It is important for reliability to prevent the formation of voids caused by electromigration and diffusion.

Low-power technology for front-end GaAs ICs and hybrid IC (HIC) for a mobile communication equipment will be presented. For low-power operation of GaAs front-end ICs, new techniques of the intermediate tuned circuits, the single-ended mixer, dualgate MESFETs, and the asymmetric self-aligned LDD process were investigated. The designed down-converter IC showed conversion gain of 21 dB, noise figure of 3.5 dB, 3rd-order intercept point in output level (IP3out) of 4.0 dBm, image-rejection ratio of 20 dB at 880 MHz, operating at 3.0 V of supply voltage and 5.0 mA of dissipation current. The down-converter IC was also designed for 1.9 GHz to obtain conversion gain of 20 dB, noise figure of 4.0 dB, IP3out of 4.0 dBm, image-rejection ratio of 20 dB at 3.0 V, 5.0 mA. The up-converter IC was designed for 1.9 GHz using the same topology of circuit and showed conversion gain of 15 dB, IP3out of 7.5 dBm, and 1 dB compression level of -8 dBm with -20 dBm of LO input power, operating at 3.0 V, 8.0 mA. Another approach to the low-power operation was carried out by HIC using the GaAs down-converter IC chip. The HIC was designed for 880 MHz to show conversion gain of 27 dB, noise figure of 3.3 dB, IP3out of 3.0 dBm, image-rejection ratio of 12 dB, at 2.7 V, 4.5 mA. The HIC measures only 8.0 mm6.0 mm1.2 mm.

Recessed-gate DMTs (doped-channel hetero-MISFETs) with i-AlGaAs/n-GaAs structure and pseudomorphic i-AlGaAs/n-InGaAs/i-GaAs structure have been developed. Broad plateaus in gm and fT provide evidence that the DMTs make the devices suitable for high-speed large-signal operation. GaAs DMTs with 0.35 µm-length have gate turn on voltage of 0.7 V, maximum transconductance of 320 mS/mm and fT of 41 GHz. Pseudomorphic DMTs have gate turn on voltage of 0.9 V, maximum transconductance of 320 mS/mm, fT of 42 GHz and have the enhanced advantages of high current drivability and large gate swing. Further more, with the use of the recessed-gate DMTs, a high-speed laser driver IC for multi-Gb/s optical communication systems are demonstrated. This laser driver IC operates at 10 Gb/s with rise and fall times as fast as 40 psec, and it can drive up to 60 mA into a 25 Ω load.