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[Keyword] SRMI(2hit)

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  • Characterization of a Silicon Wafer after the Removal of Photoresist Layer Using Two Lasers of Different Wavelengths

    Akira USAMI  Hideki FUJIWARA  Takahisa NAKAI  Kazunori MATSUKI  Tsutomu TAKEUCHI  Takao WADA  

     
    PAPER

      Vol:
    E75-C No:9
      Page(s):
    978-985

    A laser/microwave method using two lasers of different wavelengths for carrier excitation is proposed to evaluate Si surfaces. These constitute a He-Ne laser (wavelength=633 nm, penetration depth=3 µm) and a YAG laser (wavelength=1060 nm, penetration depth=500 µm). Using a microwave probe, the amount of excited carriers can be detected. The carrier concentration is mainly dependent on the condition of the surface when carriers are excited by the He-Ne laser, as well as on the condition of the bulk region when carriers are excited by the YAG laser. Microwave intensities detected under the He-Ne and the YAG lasers illumination are referred to as the surface-recombination-velocity-related microwave intensity (SRMI) and the bulk-related microwave intensity (BRMI), respectively. The difference between SRMI and BRMI is called relateve SRMI (R-SRMI), and is closely related to the condition of the surface and surface active region. We evaluate the surfaces of the samples after plasma and wet etching to remove the photoresist layer. And we evaluate the surfaces of the samples after heat or HF treatment which is done to recover the damage introduced by plasma etching. It was found that the R-SRMI method is better suited to surface evaluation than conventional lifetime measurements.

  • Improvement of Contactless Evaluation for Surface Contamination Using Two Lasers of Different Wavelengths to Exclude the Effect of Impedance Mismatching

    Akira USAMI  Hideki FUJIWARA  Noboru YAMADA  Kazunori MATSUKI  Tsutomu TAKEUCHI  Takao WADA  

     
    PAPER-Semiconductor Materials and Devices

      Vol:
    E75-C No:5
      Page(s):
    595-603

    This paper describes a new evaluation technique for Si surfaces. A laser/microwave method using two lasers of different wavelengths for carrier injection is proposed to evaluate Si surfaces. With this evaluation system, the effect of impedance mismatching between the microwave probe and the Si wafer can be eliminated. These lasers used in this experiment are He-Ne (wavelength633 nm, penetration depth3 µm) and YAG lasers (wavelength1060 nm, penetration depth500 µm). Using a microwave probe, the amount of injected excess carriers can be detected. These carrier concentrations are mainly dependent on the condition of the surface, when carriers are excited by the He-Ne laser, and the condition of the bulk region, when carriers are excited by the YAG laser. We refer to microwave intensities detected by the He-Ne and YAG lasers as the surface-recombination-velocity-related microwave intensity (SRMI) and bulk-related microwave intensity (BRMI), respectively. We refer to the difference between SRMI and BRMI as relative SRMI (R-SRMI), which is closely related to the surface condition. A theoretical analysis is performed and several experiments are conducted to evaluate Si surfaces. It is found that the R-SRMI method is better suited to surface evaluation then conventional lifetime measurements, and that the rdliability and reproducibility of measurements are improved.