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Mitsuo UKECHI Takuya MIYASHITA Ayumi TAKAHASHI Ryoji KAKU Yumiko KOMINE Takao MASE Tetsuya NISHIMURA Satoshi HIRAYAMA Kenji KAMEDA Kazuhiko ITO
We report a directly deposited dielectric multilayer onto an end face of a fluorinated polyimide optical waveguide by ion beam sputtering process. This dielectric multilayer (Ta2O5/SiO2) acts on a wavelength separation filter which passes 1310 nm wavelength signal and reflects 1550 nm wavelength signal.
Kazuo SAKAI Shinji MIGITA Hiroyuki OTA Hiroshi OTERA Ryozo AOKI
Bi2Sr2CuOx (Bi(2201)) thin films have been fabricated by atomic layer-by-layer deposition using ion beam sputtering (IBS) method. During the deposition, 14 wt%-ozone/oxygen mixture gas of typical pressure of 5.010-5 Torr is supplied with ultraviolet light irradiation for oxidation. XRD and RHEED investigations reveal that a buffer layer with compositions different from Bi(2201) is formed at the early deposition stage of less than 10 units cell and then Bi(2201) oriented along the c-axis is grown.