In order to explore the feasibility of large-scale subthreshold logic circuits and to clarify the lower limit of supply voltage (VDD) for logic circuits, the dependence of the minimum operating voltage (VDD min ) of CMOS logic gates on the number of stages, gate types and gate width is systematically measured with 90 nm CMOS ring oscillators (RO's). The measured average VDD min of inverter RO's increased from 90 mV to 343 mV when the number of RO stages increased from 11 to 1 Mega, which indicates the difficulty of VDD scaling in large-scale subthreshold logic circuits. The dependence of VDD min on the number of stages is calculated using the subthreshold current model with random threshold voltage (VTH) variations and compared with the measured results, and the tendency of the measurement is confirmed. The effect of adaptive body bias control to compensate purely random VTH variation is also investigated. Such compensation would require impractical inverter-by-inverter adaptive body bias control.

The minimum operating voltage, Vmin, of nanoscale CMOS LSIs is investigated to breach the 1-V wall that we are facing in the 65-nm device generation, and open the door to the below 0.5-V era. A new method using speed variation is proposed to evaluate Vmin. It shows that Vmin is very sensitive to the lowest necessary threshold voltage, Vt0, of MOSFETs and to threshold-voltage variations, Δ Vt, which become more significant with device scaling. There is thus a need for low-Vt0 circuits and ΔVt-immune MOSFETs to reduce Vmin. For memory-rich LSIs, the SRAM block is particularly problematic because it has the highest Vmin. Various techniques are thus proposed to reduce the Vmin: using RAM repair, shortening the data line, up-sizing, and using more relaxed MOSFET scaling. To effectively reduce Vmin of other circuit blocks, dual-Vt0 and dual-VDD circuits using gate-source reverse biasing, temporary activation, and series connection of another small low-Vt0 MOSFET are proposed. They are dynamic logic circuits enabling the power-delay product of the conventional static CMOS inverter to be reduced to 0.09 at a 0.2-V supply, and a DRAM dynamic sense amplifier and power switches operable at below 0.5 V. In addition, a fully-depleted structure (FD-SOI) and fin-type structure (FinFET) for ΔVt-immune MOSFETs are discussed in terms of their low-voltage potential and challenges. As a result, the height up-scalable FinFETs turns out to be quite effective to reduce Vmin to less than 0.5 V, if combined with the low-Vt0 circuits. For mixed-signal LSIs, investigation of low-voltage potential of analog circuits, especially for comparators and operational amplifiers, reveals that simple inverter op-amps, in which the low gain and nonlinearity are compensated for by digitally assisted analog designs, are crucial to 0.5-V operations. Finally, it is emphasized that the development of relevant devices and fabrication processes is the key to the achievement of 0.5-V nanoscale LSIs.