Amorphous indium-gallium-zinc-oxide (a-IGZO) thin film transistor (TFT) was fabricated by an advanced self-aligned imprint lithography (ASAIL) method with a hybrid etching process. The SAIL is a top-down method to fabricate a TFT using a three-dimensional multilayer etch mask having all pattern information for the TFT. The hybrid etching process was newly applied in the original SAIL process for the purpose of reducing plasma damage of a-IGZO channel layer during plasma etching in the ASAIL process. This research demonstrated that the a-IGZO TFT could be successfully fabricated by the ASAIL process. In particular, the hybrid etching process applied in this paper can be utilized for the back-channel-etch type a-IGZO TFT and further extended for the roll-to-roll backplane process.

Novel roll-to-roll (R2R) deposition and patterning of ITO on ultra-thin glass were developed with no photolithography and applied to flexible organic light emitting diodes (OLEDs). The developed deposition consists of low temperature sputtering and annealing. The developed patterning utilizes an etching paste printed by novel R2R screen printing.

Recently, flexible and lightweight optical devices are desired from the practical viewpoint. We demonstrated roll-to-roll type Anti Reflection (AR) film fabricated by layer-by-layer (LBL) adsorption process. When deposition time was 2.5 min and repeating cycle was 8 cycles, refractive index of LBL layer was 1.499 at 632 nm and thickness was 93.1 nm, which are almost the same as those of batch type LBL layer. The minimum reflectance was about 0.6% at 600 nm and transmittance was over 75% at visible region. However as compared with batch type, roll type AR film has lower reflectance and transmittance. This reason is that the flow of solution and rinse and quantity of rinse was smaller, a number of bathes of roll type was lower than that of batch type. Furthermore, comparing the deposition time and film speed, LBL layer was fabricated clearly long deposition time and slow film speed. The roll-to-roll film had a problem of peeling off during the deposition process. By increasing the contact area between film and guided roll, vertical pressure was decrease and friction force was decreased. Furthermore, as rotational speed of guided roll and film speed was decreased, LBL layer was not peeled by friction force between film and guided roll. Because rotational speed of guided rolls and films were almost same in the range of less than about 30 mm/min. There was the problem that polymer complexes were likely to appear on the substrate when the surface was dried during moving between solution and rinse bath. This phenomenon was observed during the roll-to-roll as well as batch process. The quality of roll-to-roll LBL process was depending on deposition time and film speed and drying at moving process critically compared with batch type. It is necessary to design the roll-to-roll machine with care: important points are deposition time and film speed, drying at moving process.