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Design and Simulation of Asymmetric MOSFETs

Jong Pil KIM, Woo Young CHOI, Jae Young SONG, Seongjae CHO, Sang Wan KIM, Jong Duk LEE, Byung-Gook PARK

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Summary :

A novel asymmetric MOSFET with no LDD on the source side is simulated on bulk-Si using a device simulator (SILVACO). In order to overcome the problems of the conventional asymmetric process, a novel asymmetric MOSFET using mesa structure and sidewall spacer gate is proposed which provides self-alignment process, aggressive scaling, and uniformity. First of all, we have simulated to compare the characteristics between asymmetric and symmetric MOSFETs. Basically, both asymmetric and symmetric MOSFETs have an n-type channel (25-nm) and the same physical parameters. When we compare this with the 25-nm symmetric MOSFET, the proposed asymmetric MOSFET shows better device performances.

Publication
IEICE TRANSACTIONS on Electronics Vol.E90-C No.5 pp.978-982
Publication Date
2007/05/01
Publicized
Online ISSN
1745-1353
DOI
10.1093/ietele/e90-c.5.978
Type of Manuscript
Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category
Junction Formation and TFT Reliability

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