TCAD--Yesterday, Today and Tomorrow
Summary :
This paper outlines the modeling requirements of integrated circuit (IC) fabrication processes that have lead to and sustained the development of computer-aided design of technology (i. e. TCAD). Over a period spanning more than two decades the importance of TCAD modeling and the complexity of required models has grown steadily. The paper also illustrates typical applications where TCAD has been powerful and strategic to IC scaling of processes. Finally, the future issues of atomic-scale modeling and the need for an hierarchical approach to capture and use such detailed information at higher levels of simulation are discussed.
- Publication
- IEICE TRANSACTIONS on Electronics Vol.E82-C No.6 pp.791-799
- Publication Date
- 1999/06/25
- Publicized
- Online ISSN
- DOI
- Type of Manuscript
- Special Section INVITED PAPER (Special Issue on TCAD for Semiconductor Industries)
- Category
Authors
Keyword
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Robert W. DUTTON, "TCAD--Yesterday, Today and Tomorrow" in IEICE TRANSACTIONS on Electronics,
vol. E82-C, no. 6, pp. 791-799, June 1999, doi: .
Abstract: This paper outlines the modeling requirements of integrated circuit (IC) fabrication processes that have lead to and sustained the development of computer-aided design of technology (i. e. TCAD). Over a period spanning more than two decades the importance of TCAD modeling and the complexity of required models has grown steadily. The paper also illustrates typical applications where TCAD has been powerful and strategic to IC scaling of processes. Finally, the future issues of atomic-scale modeling and the need for an hierarchical approach to capture and use such detailed information at higher levels of simulation are discussed.
URL: https://global.ieice.org/en_transactions/electronics/10.1587/e82-c_6_791/_p
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@ARTICLE{e82-c_6_791,
author={Robert W. DUTTON, },
journal={IEICE TRANSACTIONS on Electronics},
title={TCAD--Yesterday, Today and Tomorrow},
year={1999},
volume={E82-C},
number={6},
pages={791-799},
abstract={This paper outlines the modeling requirements of integrated circuit (IC) fabrication processes that have lead to and sustained the development of computer-aided design of technology (i. e. TCAD). Over a period spanning more than two decades the importance of TCAD modeling and the complexity of required models has grown steadily. The paper also illustrates typical applications where TCAD has been powerful and strategic to IC scaling of processes. Finally, the future issues of atomic-scale modeling and the need for an hierarchical approach to capture and use such detailed information at higher levels of simulation are discussed.},
keywords={},
doi={},
ISSN={},
month={June},}
Copy
TY - JOUR
TI - TCAD--Yesterday, Today and Tomorrow
T2 - IEICE TRANSACTIONS on Electronics
SP - 791
EP - 799
AU - Robert W. DUTTON
PY - 1999
DO -
JO - IEICE TRANSACTIONS on Electronics
SN -
VL - E82-C
IS - 6
JA - IEICE TRANSACTIONS on Electronics
Y1 - June 1999
AB - This paper outlines the modeling requirements of integrated circuit (IC) fabrication processes that have lead to and sustained the development of computer-aided design of technology (i. e. TCAD). Over a period spanning more than two decades the importance of TCAD modeling and the complexity of required models has grown steadily. The paper also illustrates typical applications where TCAD has been powerful and strategic to IC scaling of processes. Finally, the future issues of atomic-scale modeling and the need for an hierarchical approach to capture and use such detailed information at higher levels of simulation are discussed.
ER -
English
