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Development of an Enterprise-Wide Yield Management System Using Critical Area Analysis for High-Product-Mix Semiconductor Manufacturing

Yuichi HAMAMURA, Chizu MATSUMOTO, Yoshiyuki TSUNODA, Koji KAMODA, Yoshio IWATA, Kenji KANAMITSU, Daisuke FUJIKI, Fujihiko KOJIKA, Hiromi FUJITA, Yasuo NAKAGAWA, Shun'ichi KANEKO

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Summary :

To improve product yield in high-product-mix semiconductor manufacturing, it is important to estimate the systematic yield inherent to each product and to extract problematic products that have low systematic yields. We propose a simplified and available yield model using a critical area analysis. This model enables the extraction of problematic products by the relationship between actual yields and the short sensitivities of the products. Furthermore, we present an enterprise-wide yield management system using this model and some useful applications. As a result, the system increases the efficiency of the yield management and enhancement dramatically.

Publication
IEICE TRANSACTIONS on Electronics Vol.E92-C No.1 pp.144-152
Publication Date
2009/01/01
Publicized
Online ISSN
1745-1353
DOI
10.1587/transele.E92.C.144
Type of Manuscript
PAPER
Category
Semiconductor Materials and Devices

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