A high speed, 4 K word by one bit static Random Access Memory (RAM) has been developed, using Diffusion Self-Aligned (DSA) MOS technology. High speed and low power operation was achieved by combining the following refined devices and new circuit technology; high gain DSA MOS FETs as drivers, Reverse DSA (RDSA) MOS FETs with low threshold voltage (VTAR
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Mitsutaka MORIMOTO, Kazukiyo TAKAHASHI, Hiroki MUTA, "High Speed DSA 4 Kbit Static RAM" in IEICE TRANSACTIONS on transactions,
vol. E63-E, no. 7, pp. 520-525, July 1980, doi: .
Abstract: A high speed, 4 K word by one bit static Random Access Memory (RAM) has been developed, using Diffusion Self-Aligned (DSA) MOS technology. High speed and low power operation was achieved by combining the following refined devices and new circuit technology; high gain DSA MOS FETs as drivers, Reverse DSA (RDSA) MOS FETs with low threshold voltage (VTAR
URL: https://global.ieice.org/en_transactions/transactions/10.1587/e63-e_7_520/_p
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@ARTICLE{e63-e_7_520,
author={Mitsutaka MORIMOTO, Kazukiyo TAKAHASHI, Hiroki MUTA, },
journal={IEICE TRANSACTIONS on transactions},
title={High Speed DSA 4 Kbit Static RAM},
year={1980},
volume={E63-E},
number={7},
pages={520-525},
abstract={A high speed, 4 K word by one bit static Random Access Memory (RAM) has been developed, using Diffusion Self-Aligned (DSA) MOS technology. High speed and low power operation was achieved by combining the following refined devices and new circuit technology; high gain DSA MOS FETs as drivers, Reverse DSA (RDSA) MOS FETs with low threshold voltage (VTAR
keywords={},
doi={},
ISSN={},
month={July},}
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TY - JOUR
TI - High Speed DSA 4 Kbit Static RAM
T2 - IEICE TRANSACTIONS on transactions
SP - 520
EP - 525
AU - Mitsutaka MORIMOTO
AU - Kazukiyo TAKAHASHI
AU - Hiroki MUTA
PY - 1980
DO -
JO - IEICE TRANSACTIONS on transactions
SN -
VL - E63-E
IS - 7
JA - IEICE TRANSACTIONS on transactions
Y1 - July 1980
AB - A high speed, 4 K word by one bit static Random Access Memory (RAM) has been developed, using Diffusion Self-Aligned (DSA) MOS technology. High speed and low power operation was achieved by combining the following refined devices and new circuit technology; high gain DSA MOS FETs as drivers, Reverse DSA (RDSA) MOS FETs with low threshold voltage (VTAR
ER -