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[Author] Riichiro TAKEMURA(6hit)

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  • Current-Voltage Characteristics of Triple-Barrier Resonant Tunneling Diodes Including Coherent and Incoherent Tunneling Processes

    Riichiro TAKEMURA  Michihiko SUHARA  Yasuyuki MIYAMOTO  Kazuhito FURUYA  Yuji NAKAMURA  

     
    PAPER

      Vol:
    E79-C No:11
      Page(s):
    1525-1529

    Current-voltage characteristics of triple-barrier resonant tunneling diodes are theoretically analyzed taking phase breaking into account. The peak current in predicted using conventional theories is much smaller, typically by a factor of 1/3000 for a coherent length of 100 nm, than that measured because the incoherent tunneling process is neglected. We take both the coherent and the incoherent tunneling processes into account in the analysis and show that the product of the peak current and the voltage width at half maximum of the peak current is almost constant even when the phase coherent length varies between 50 and 1000 nm. The peak current density increases by two orders of magnitude in the model developed here.

  • Fluctuation Tolerant Charge-Integration Read Scheme for Ultrafast DNA Sequencing with Nanopore Device

    Kazuo ONO  Yoshimitsu YANAGAWA  Akira KOTABE  Riichiro TAKEMURA  Tatsuo NAKAGAWA  Tomio IWASAKI  Takayuki KAWAHARA  

     
    PAPER

      Vol:
    E95-C No:4
      Page(s):
    651-660

    A charge-integration read scheme has been developed for a solid-nanopore DNA-sequencer that determines a genome by direct and electrical measurements of transverse tunneling current in single-stranded DNA. The magnitude of the current was simulated with a first-principles molecular dynamics method. It was found that the magnitude is as small as in the sub-pico ampere range, and signals from four bases represent wide distributions with overlaps between each base. The distribution is believed to originate with translational and rotational motion of DNA in a nanopore with a frequency of over 105 Hz. A sequence scheme is presented to distinguish the distributed signals. The scheme makes widely distributed signals time-integrated convergent by cumulating charge at the capacitance of a nanopore device and read circuits. We estimated that an integration time of 1.4 ms is sufficient to obtain a signal difference of over 10 mV for distinguishing between each DNA base. Moreover, the time is shortened if paired bases, such as A-T and C-G in double-stranded DNA, can be measured simultaneously with two nanopores. Circuit simulations, which included the capacitance of a nanopore calculated with a device simulator, successfully distinguished between DNA bases in less than 2.0 ms. The speed is roughly six orders faster than that of a conventional DNA sequencer. It is possible to determine the human genome in one day if 100-nanopores are operated in parallel.

  • Long-Retention-Time, High-Speed DRAM Array with 12-F2 Twin Cell for Sub 1-V Operation

    Riichiro TAKEMURA  Kiyoo ITOH  Tomonori SEKIGUCHI  Satoru AKIYAMA  Satoru HANZAWA  Kazuhiko KAJIGAYA  Takayuki KAWAHARA  

     
    PAPER-Memory

      Vol:
    E90-C No:4
      Page(s):
    758-764

    A DRAM-cell array with 12-F2 twin cell was developed and evaluated in terms of speed, retention time, and low-voltage operation. The write and read-out times of the twin-cell array are shorter than those of a single-cell array by 70% and 40% respectively, because of parallel writing and reading of half charge to and from two memory cells. According to measured retention characteristics of the single cells, the twin-cell array improves retention time by 20% compared with the single-cell array at 1 V and keeps the retention time of the single-cell array at 0.4 V. Furthermore, the cell accepts the plate-driven scheme without the need of a dummy cell, lowering the necessary word-line voltage by 0.4 V.

  • 0.5-V 25-nm 6-T Cell with Boosted Word Voltage for 1-Gb SRAMs

    Akira KOTABE  Kiyoo ITOH  Riichiro TAKEMURA  

     
    PAPER

      Vol:
    E95-C No:4
      Page(s):
    555-563

    It is shown that it is feasible to apply 0.5-V 6-T SRAM cells in a 25-nm high-speed 1-Gb e-SRAM. In particular, for coping with rapidly reduced voltage margin as VDD is reduced, a boosted word-voltage scheme is first proposed. Second, Vt variations are reduced with repair techniques and nanoscale FD-MOSFETs to further widen the voltage margin. Third, a worst case design is developed, for the first time, to evaluate the cell. This design features a dynamic margin analysis and takes subthreshold current, temperature, and Vt variations and their combination in the cell into account. Fourth, the proposed scheme is evaluated by applying the worst-case design and a 25-nm planar FD-SOI MOSFET. It is consequently found that the scheme provides a wide margin and high speed even at 0.5 V. A 0.5-V high-speed 25-nm 1-Gb SRAM is thus feasible. Finally, to further improve the scheme, it is shown that it is necessary to use FinFETs and suppress and compensate process, voltage, and temperature variations in a chip and wafer.

  • Small-Sized Leakage-Controlled Gated Sense Amplifier for 0.5-V Multi-Gigabit DRAM Arrays

    Akira KOTABE  Riichiro TAKEMURA  Yoshimitsu YANAGAWA  Tomonori SEKIGUCHI  Kiyoo ITOH  

     
    PAPER

      Vol:
    E95-C No:4
      Page(s):
    594-599

    A small-sized leakage-controlled gated sense amplifier (SA) and relevant circuits are proposed for 0.5-V multi-gigabit DRAM arrays. The proposed SA consists of a high-VT PMOS amplifier and a low-VT NMOS amplifier which is composed of high-VT NMOSs and a low-VT cross-coupled NMOS, and achieves 46% area reduction compared to a conventional SA with a low-VT CMOS preamplifier. Separation of the proposed SA and a data-line pair achieves a sensing time of 6 ns and a writing time of 0.6 ns. Momentarily overdriving the PMOS amplifier achieves a restoring time of 13 ns. The gate level control of the high-VT NMOSs and the gate level compensation circuit for PVT variations reduce the leakage current of the proposed SA to 2% of that without the control, and its effectiveness was confirmed using a 50-nm test chip.

  • A Low-Vt Small-Offset Gated-Preamplifier for Sub-1-V DRAM Mid-Point Sensing

    Satoru AKIYAMA  Riichiro TAKEMURA  Tomonori SEKIGUCHI  Akira KOTABE  Kiyoo ITOH  

     
    PAPER

      Vol:
    E95-C No:4
      Page(s):
    600-608

    A gated sense amplifier (GSA) consisting of a low-Vt gated preamplifier (LGA) and a high-Vt sense amplifier (SA) is proposed. The gating scheme of the LGA enables quick amplification of an initial cell signal voltage (vS0) because of its low Vt and prevents the cell signal from degrading due to interference noise between data lines. As for a conventional sense amplifier (CSA), this new type of noise causes sensing error, and the noise-generation mechanism was clarified for the first time by analysis of vS0. The high-Vt SA holds the amplified signal and keeps subthreshold current low. Moreover, the gating scheme of the low-Vt MOSFETs in the LGA drives the I/O line quickly. The GSA thus simultaneously achieves fast sensing, low-leakage data holding, and fast I/O driving, even for sub-1-V mid-point sensing. The GSA is promising for future sub-1-V gigabit dynamic random-access memory (DRAM) because of reduced variations in the threshold voltage of MOSFETs; thus, the offset voltage of the LGA is reduced. The effectiveness of the GSA was verified with a 70-nm 512-Mbit DRAM chip. It demonstrated row access time (tRCD) of 16.4 ns and read access (tAA) of 14.3 ns at array voltage of 0.9 V.