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The discharge properties and chemical surface stability of CeO2 containing Sr (CeSrO) as the candidate for high-γ protective layer of noble plasma display panels (PDPs) are characterized. CeSrO films have superior chemical stability, because of the decrease in reactiveness on surface due to their fluorite structure. The discharge voltage is 50 V lower than that of MgO films for a pure discharge gas of Ne/Xe = 85/15 at 60 kPa. However the topmost surface, monolayer, of the CeSrO film relevant to the discharge property is hardly recovered from the damage by CO2 impurity in discharge gas. We can expect that by pumping down to a sufficiently low CO2 partial pressure (lower than 1
Yasuhiro YAMAUCHI
Yusuke FUKUI
Yosuke HONDA
Michiko OKAFUJI
Masahiro SAKAI
Mikihiko NISHITANI
Yasushi YAMAUCHI
PDP, γ, protective layer, discharge, MgO
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Yasuhiro YAMAUCHI, Yusuke FUKUI, Yosuke HONDA, Michiko OKAFUJI, Masahiro SAKAI, Mikihiko NISHITANI, Yasushi YAMAUCHI, "Effect of Impurity in Discharge Gas on High γ Properties of Newly Developed CeSrO Film for Novel Plasma Display Panel" in IEICE TRANSACTIONS on Electronics,
vol. E95-C, no. 11, pp. 1761-1768, November 2012, doi: 10.1587/transele.E95.C.1761.
Abstract: The discharge properties and chemical surface stability of CeO2 containing Sr (CeSrO) as the candidate for high-γ protective layer of noble plasma display panels (PDPs) are characterized. CeSrO films have superior chemical stability, because of the decrease in reactiveness on surface due to their fluorite structure. The discharge voltage is 50 V lower than that of MgO films for a pure discharge gas of Ne/Xe = 85/15 at 60 kPa. However the topmost surface, monolayer, of the CeSrO film relevant to the discharge property is hardly recovered from the damage by CO2 impurity in discharge gas. We can expect that by pumping down to a sufficiently low CO2 partial pressure (lower than 1
URL: https://global.ieice.org/en_transactions/electronics/10.1587/transele.E95.C.1761/_p
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@ARTICLE{e95-c_11_1761,
author={Yasuhiro YAMAUCHI, Yusuke FUKUI, Yosuke HONDA, Michiko OKAFUJI, Masahiro SAKAI, Mikihiko NISHITANI, Yasushi YAMAUCHI, },
journal={IEICE TRANSACTIONS on Electronics},
title={Effect of Impurity in Discharge Gas on High γ Properties of Newly Developed CeSrO Film for Novel Plasma Display Panel},
year={2012},
volume={E95-C},
number={11},
pages={1761-1768},
abstract={The discharge properties and chemical surface stability of CeO2 containing Sr (CeSrO) as the candidate for high-γ protective layer of noble plasma display panels (PDPs) are characterized. CeSrO films have superior chemical stability, because of the decrease in reactiveness on surface due to their fluorite structure. The discharge voltage is 50 V lower than that of MgO films for a pure discharge gas of Ne/Xe = 85/15 at 60 kPa. However the topmost surface, monolayer, of the CeSrO film relevant to the discharge property is hardly recovered from the damage by CO2 impurity in discharge gas. We can expect that by pumping down to a sufficiently low CO2 partial pressure (lower than 1
keywords={},
doi={10.1587/transele.E95.C.1761},
ISSN={1745-1353},
month={November},}
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TY - JOUR
TI - Effect of Impurity in Discharge Gas on High γ Properties of Newly Developed CeSrO Film for Novel Plasma Display Panel
T2 - IEICE TRANSACTIONS on Electronics
SP - 1761
EP - 1768
AU - Yasuhiro YAMAUCHI
AU - Yusuke FUKUI
AU - Yosuke HONDA
AU - Michiko OKAFUJI
AU - Masahiro SAKAI
AU - Mikihiko NISHITANI
AU - Yasushi YAMAUCHI
PY - 2012
DO - 10.1587/transele.E95.C.1761
JO - IEICE TRANSACTIONS on Electronics
SN - 1745-1353
VL - E95-C
IS - 11
JA - IEICE TRANSACTIONS on Electronics
Y1 - November 2012
AB - The discharge properties and chemical surface stability of CeO2 containing Sr (CeSrO) as the candidate for high-γ protective layer of noble plasma display panels (PDPs) are characterized. CeSrO films have superior chemical stability, because of the decrease in reactiveness on surface due to their fluorite structure. The discharge voltage is 50 V lower than that of MgO films for a pure discharge gas of Ne/Xe = 85/15 at 60 kPa. However the topmost surface, monolayer, of the CeSrO film relevant to the discharge property is hardly recovered from the damage by CO2 impurity in discharge gas. We can expect that by pumping down to a sufficiently low CO2 partial pressure (lower than 1
ER -