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[Author] Takahiro TSURUDA(2hit)

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  • Features of SOI DRAM's and their Potential for Low-Voltage and/or Giga-Bit Scale DRAM's

    Yasuo YAMAGUCHI  Toshiyuki OASHI  Takahisa EIMORI  Toshiaki IWAMATSU  Shouichi MITAMOTO  Katsuhiro SUMA  Takahiro TSURUDA  Fukashi MORISHITA  Masakazu HIROSE  Hideto HIDAKA  Kazutami ARIMOTO  Kazuyasu FUJISHIMA  Yasuo INOUE  Tadashi NISHIMURA  Hirokazu MIYOSHI  

     
    INVITED PAPER-Dynamic RAMs

      Vol:
    E79-C No:6
      Page(s):
    772-780

    SOI DRAM's are candidates for giga-bit scale DRAM's due to the inherent features of SOI structure, and are also desired to be used as low-voltage memories which will be used in portable systems in the forthcoming multimedia era. However, some drawbacks are also anticipated owing to floating substrate effects. In this report, the advantages and problems concerning SOI DRAM's were reconsidered by evaluation of our test devices and also by analysis with device and circuit simulators for their future prospects. The following advantages of SOI DRAM's were verified. Low-voltage operation, active current reduction and speed gain were obtained by the reduced junction capacitance and the back-gate-bias effect. Static refresh characteristics were improved due to the reduced junction area. Soft error immunity was improved greatly by the complete isolation of the active region when the body potential is fixed. The problems that need to be resolved are closely related to the floating substrate effect. The soft error immunity in a floating body condition and the dynamic refresh characteristics were degraded by the instability of the floating body potential. Process and device approaches such as the field-shield-body-fixing method as well as circuit approaches like the BSG scheme are required to eliminate the floating substrate effects. From these investigations it can be said that a low-voltage DRAM with a current design rule would be possible if we pay close attention to the floating-substrate-related issues by optimizing various process/device and circuit techniques. With further development of the technology to suppress the floating substrate effects, it will be possible to develop simple and low-cost giga-bit level SOI DRAM's which use the SOI's inherent features to the full.

  • SOI-DRAM Circuit Technologies for Low Power High Speed Multigiga Scale Memories

    Shigehiro KUGE  Fukashi MORISHITA  Takahiro TSURUDA  Shigeki TOMISHIMA  Masaki TSUKUDE  Tadato YAMAGATA  Kazutami ARIMOTO  

     
    PAPER-Memory

      Vol:
    E79-C No:7
      Page(s):
    997-1002

    This parer describes a silicon on insulator(SOI) DRAM which has a body bias controlling technique for high-speed circuit operation and a new type of redundancy for low standby power operation, aimed at high yield. The body bias controlling technique contributes to super-body synchronous sensing and body-bias controlled logic. The super-body synchronous sensing achieves 3.0 ns faster sensing than body synchronous sensing and the body-bias controlled logic realizes 8.0 ns faster peripheral logic operation compared with a conventional logic scheme, at 1.5 V in a 4 Gb-level SOI DRAM. The body-bias controlled logic also realizes a body-bias change current reduction of 1/20, compared with a bulk well-structure. A new type of redundancy that overcomes the standby current failure resulting from a wordline-bitline Short is also discussed in respect of yield and area penalty.