When BJTs are irradiated by gamma rays, interface trapped charges and positive oxide trapped charges are formed by ionization at the Si-SiO2 interface and SiO2 regions, respectively. These trapped charges affect the movement of carriers depending on the type of BJT. This paper presents experimental results regarding operating characteristics of gamma irradiated pnp Si BJTs.

In this paper, we suggest a novel pnp BJT structure to improve the matching characteristics of the bipolar junction transistor (BJT) which is fabricated using standard CMOS process. In the case of electrical characteristics, the collector current density Jc of the proposed structure (T2) is a little greater than the conventional structure (T1), which contributes to the greater current gain β of the proposed structure than the conventional structure. Although the matching characteristics of the collector current density of the proposed structure is almost similar to the conventional structure, that of the current gain of the proposed structure is better than the conventional structure about 14.81% due to the better matching characteristics of the base current density of the proposed structure about 59.34%. Therefore, the proposed BJT structure is desirable for high performance analog/digital mixed signal application.

A selectively ion-implanted collector (SIC) is implemented in a 0.8 µm BiCMOS process to improve the RF characteristics of the BJT devices. The SIC BJT device has better ft and fmax than the FIC (fully ion-implanted collector) BJT device because the extrinsic base-collector capacitance is reduced by the SIC process. The ft is 7.8 GHz and fmax is 9.5 GHz for the SIC BJT device while the ft is 7.2 GHz and fmax is 4.5 GHz for the FIC BJT device when biased at Vce=3.6 V and Jc=0.07 mA/µm2. The noise parameters are the same for both BJT devices but the associated gain is higher for the SIC BJT device.

Even though BiCMOS process has an ability to make both BJT and MOSFET on single-chip, only BJT has been used for BiCMOS Si-MMIC LNA because of its low noise and high gain performance under low d. c. supply power. But the distortion performance of BJT should be improved for the receiver applications in some wireless systems. In this paper, intermodulation distortion characteristics comparison is carried out between BJT and MOSFET fabricated in the same BiCMOS process by the analysis based on the simplified transistor models with extracted device parameters. The analytical result shows that MOSFET has lower intermodulation distortion characteristics compared with BJT, and the result is evaluated by the measurements. In order to obtain both low distortion and low noise characteristics, a two-stage Si-MMIC LNA is developed by using BJT as the 1st stage and MOSFET as the 2nd stage of LNA. The fabricated LNA performs NF of 2.45 dB, gain of 19.3 dB, IIP3 of14.6 dBm and OIP3 of 4.7 dBm under 3 V/7.2 mA d. c. supply power.

A technique to realize a transconductance which is relatively insensitive over temperature variations is reported. Simulation results with MOS and bipolar transistors indicate substantial improvement in temperature insensitivity over a range exceeding 100 degrees Celsius. It should find useful applications in analog LSI/VLSI systems operating over a wide range of temperature.