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Masataka MINAMI Nagatoshi OHKI Hiroshi ISHIDA Toshiaki YAMANAKA Akihiro SHIMIZU Koichiro ISHIBASHI Akira SATOH Tokuo KURE Takashi NISHIDA Takahiro NAGANO
A high-performance microprocessor-compatible small size full CMOS SRAM cell technology for under 1.8-V operation has been developed. Less than 1-µm spacing between the n and pMOSFETs is achieved by using a retrograde well combined with SSS-OSELO technology. To connect the gates of a driver nMOSFET and a load pMOSFET directly, a 0.3-µm n-gate load pMOSFET, formed by amorphous-Si-film through-channel implantation, is merged with a 0.25-µm p-gate pMOSFET for the peripheral circuits. The memory cell area is reduced by using a mask-free contact process for the local interconnect, which includes titanium-nitride wet-etching using a plasma-TEOS silicone-dioxide mask. The newly developed memory cell was demonstrated using 0.25-µm CMOS process technology. A 6.93-µm2 and 1-V operation full CMOS SRAM cell with a high-performance circuit was achieved by a simple fabrication process.
Hiroyuki MIZUNO Takahiro NAGANO
A novel SRAM cell architecture for sub-1-V high-speed operation is proposed operation is proposed that uses neither low-Vth MOSFET's nor modified cell layout patterns. A source-line, connected to the source terminals of the driver MOSFET's is controlled so that it is negative and floating in the read and write cycles, respectively. This improved the bit-line access time by 1/4-1/2 at supply voltages of 0.5-1.0 V. Limiting the bit-line swing reduces by 1/10 the writing power needed to charge them and allows faster write-recovery, as well. The achievability of low-power 100-MHz operation over a wide range of supply voltages is demonstrated.
Koichiro ISHIBASHI Koichi TAKASUGI Kunihiro KOMIYAJI Hiroshi TOYOSHIMA Toshiaki YAMANAKA Akira FUKAMI Naotaka HASHIMOTO Nagatoshi OHKI Akihiro SHIMIZU Takashi HASHIMOTO Takahiro NAGANO Takashi NISHIDA
A 4-Mb CMOS SRAM with 3.84 µm2 TFT load cells is fabricated using 0.25-µm CMOS technology and achieves an address access time of 6 ns at a supply voltage of 2.7 V. The use of a current sense amplifier that is insensitive to its offset voltage enables the fast access time. A boosted cell array architecture allows low voltage operation of fast SRAM's using TFT load cells.
Hisayuki HIGUCHI Suguru TACHIBANA Masataka MINAMI Takahiro NAGANO
Low-power, high-speed match-detection circuits for a content addressable memory(CAM) are proposed and evaluated. The circuits consist a current supply to a match-line, a differential amplifier, and 9-MOSFET CAM cells. The implementation of these circuits made it possible to realize a 16-entry, 32-bit data-compare CAM TEG of 1.2-ns matchdetection time with 5-mW power dissipation in 10-ns cycle-time.