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Koichiro ISHIBASHI Koichi TAKASUGI Kunihiro KOMIYAJI Hiroshi TOYOSHIMA Toshiaki YAMANAKA Akira FUKAMI Naotaka HASHIMOTO Nagatoshi OHKI Akihiro SHIMIZU Takashi HASHIMOTO Takahiro NAGANO Takashi NISHIDA
A 4-Mb CMOS SRAM with 3.84 µm2 TFT load cells is fabricated using 0.25-µm CMOS technology and achieves an address access time of 6 ns at a supply voltage of 2.7 V. The use of a current sense amplifier that is insensitive to its offset voltage enables the fast access time. A boosted cell array architecture allows low voltage operation of fast SRAM's using TFT load cells.
Koichiro ISHIBASHI Katsuro SASAKI Toshiaki YAMANAKA Hiroshi TOYOSHIMA Fumio KOJIMA
An all-CMOS output buffer has been developed. The output buffer is composed of a voltage-follower and a source-follower circuit. The performance of the output buffer is characterized by a low-voltage operation of 1.7 V, a short delay of 1 ns, availability for the wired-OR connection, and adjustability to TTL, ECL, and a reduced swing level (RSL). The output buffer is incorporated into a 64-kb CMOS SRAM. This SRAM has achieved an access time of 4.3 ns at a supply voltage of -3.6 V.
Hideharu YAHATA Yoji NISHIO Kunihiro KOMIYAJI Hiroshi TOYOSHIMA Atsushi HIRAISHI Yoshitaka KINOSHITA
A 167-MHz 1-Mbit CMOS synchronous cache SRAM was developed using 0.40-µm process technology. The floor plan was designed so that the address registers are located in the center of the chip, and high-speed circuits were developed such as the quasi latch (QL) sense amplifier and the one-shot control (OSC) output register. To maintain suitable setup and hold time margins, an equivalent margin (EM) design method was developed. 167-MHz operation was measured at a supply voltage of 2.5 V and an ambient temperature of 75. The same margins 1.1 ns of the setup time and hold time were measured for the specifications of a setup time of 2.0 ns and a hold time of 0.5 ns.