A 167-MHz 1-Mbit CMOS synchronous cache SRAM was developed using 0.40-µm process technology. The floor plan was designed so that the address registers are located in the center of the chip, and high-speed circuits were developed such as the quasi latch (QL) sense amplifier and the one-shot control (OSC) output register. To maintain suitable setup and hold time margins, an equivalent margin (EM) design method was developed. 167-MHz operation was measured at a supply voltage of 2.5 V and an ambient temperature of 75. The same margins 1.1 ns of the setup time and hold time were measured for the specifications of a setup time of 2.0 ns and a hold time of 0.5 ns.

A 4-Mb CMOS SRAM with 3.84 µm2 TFT load cells is fabricated using 0.25-µm CMOS technology and achieves an address access time of 6 ns at a supply voltage of 2.7 V. The use of a current sense amplifier that is insensitive to its offset voltage enables the fast access time. A boosted cell array architecture allows low voltage operation of fast SRAM's using TFT load cells.

A 16-Mb CMOS SRAM using 0.4-µm CMOS technology has been developed. This SRAM features common-centroid-geometry (CCG) layout sense amplifiers which shorten the access time by 2.4 ns. A flexible redundancy technique achieves high efficiency without any access penalty. A memory cell with stacked capacitors is fabricated for high soft-error immunity. A 16-Mb SRAM with a chip size of 215 mm2 is fabricated and an address access time of 12.5 ns has been achieved.