Takaho TANIGAWA Akira YOSHINO Hiroki KOGA Shuichi OHYA
Stacked capacitor dynamic random access memory(DRAM) cells with both NMOS and PMOS cell transistors(Lg=0.4µm) were fabricated on ultra-thin SIMOX(separation by implantation of oxygen) substrates, and the data retention time was compared with that of a bulk counterpart. A DATA retention time of 550 sec(at 25 ) could be achieved using ultra-thin SIMOX substrates, which is 6 times longer than that using the bulk substrate. A stacked capacitor cell with a PMOS cell transistor on an ultra-thin SIMOX substrate is very attractive and promising for future giga-bit DRAM cells.
Isao NARITAKE Tadahiko SUGIBAYASHI Satoshi UTSUGI Tatsunori MUROTANI
A crossing charge recycle refresh(CCRR) scheme and a serial charge recycle refresh(SCRR) scheme are proposed for the large capacity DRAMs with hierarchical bit-line architecture to reduce main bit-line charging current. A separated driver sense-amplifier(SDSA) circuit is essential to realize this scheme because it features 11 times shorter charge transfer period than that of conventional sense-amplifiers. These circuits are applied to an experimental 1-Gb DRAM, which achieves reduction of main bit-line charging current to 37.5%.
Masami AOKI Tohru OZAKI Takashi YAMADA Takeshi HAMAMOTO
A 0.96µm2 NAND-structured stacked capacitor cell has been achieved using conventional i-line photolithography and a 0.4µm design rule. Memory cell patterns for critical levels have been designed with a simple lineand-space configuration and a completely repeated hole arrangement for large lithography process margin. The word-line pitch and bit-line pitch are 0.9µm and0.95µm, respectively. In order to obtain sufficient storage capacitance and large alignment margin, a self-aligned cylindrical stacked capacitor and bit line plug fabrication process has been developed. These new technologies have enabled storage capacitance of 15 fF/cell with a 0.5µm capacitor height and a 5 nm equivalent SiO2 film thickness for nitride-top oxide(NO) film in the bit-line over capacitor(BOC) structure. Due to its lithography-oriented cell design and self-aligned process procedure, the present cell is a promising candidate for 256 Mb DRAM and beyond.
Yoshinori OKAJIMA Masao TAGUCHI Miki YANAGAWA Koichi NISHIMURA Osamu HAMADA
We report two new timing control methods for high-speed synchronous interfaces in view of their application to high-speed synchronous DRAMs. These two new circuits are the measure-controlled DLL and the register-controlled DLL.We quantitatively analyzed the minimum operational cycle time for a synchronous interface, and related the minimum bus cycle time to two factors; the bus-to-clock timing skew, and the unit delay time of the DLL. Based on this analysis, we concluded that the I/O performance can be beyond 400 MHz by suppressing both factors to less than 200 ps.
Chikahito NAKAJIMA Toshihiro YAZAWA
This paper proposes a new approach for inputting handwritten Distribution Facility Drawings (DFD) and their maps into a computer automatically by using the Facility Management Database (FMD). Our recognition method makes use of external information for drawing/map recognition. It identifies each electric-pole symbol and support cable symbol on drawings simply by consulting the FMD. Other symbols such as transformers and electric wires can be placed on drawings automatically. In this positioning of graphic symbols, we present an automatic adjustment method of a symbol's position on the latest digital maps. When a contradiction is unsolved due to an inconsistency between the content of the DFD and the FMD, the system requests a manual feedback from the operator. Furthermore, it uses the distribution network of the DFD to recognize the street lines on the maps which aren't computerized. This can drastically reduce the cost for computerizing drawings and maps.
Masaki KUMANOYA Toshiyuki OGAWA Yasuhiro KONISHI Katsumi DOSAKA Kazuhiro SHIMOTORI
Various kinds of new architectures have been proposed to enhance operating performance of the DRAM. This paper reviews these architectures including EDO, SDRAM, RDRAM, EDRAM, and CDRAM. The EDO slightly modifies the output control of the conventional DRAM architecture. Other innovative architectures try to enhance the performance by taking advantage of DRAM's internal multiple bits architecture with internal pipeline, parallel-serial conversion, or static buffers/on-chip cache. A quantitative analysis based on an assumption of wait cycles was made to compare PC system performance with some architectures. The calculation indicated the effectiveness of external or on-chip cache. Future trends cover high-speed I/O interface, unified memory architecture, and system integrated memory. The interface includes limited I/O swing such as HSTL and SSTL to realize more than 100MHz operation. Also, Ramlink and SyncLink are briefly reviewed as candidates for next generation interface. Unified memory architecture attempts to save total memory capacity by combining graphics and main memory. Advanced device technology enables system integration which combine system logic and memory. It suggests one potential direction towards system on a chip in the future.
Kan TAKEUCHI Katsumi MATSUNO Yoshinobu NAKAGOME Masakazu AOKI
An architecture for a high-density nonvolatile memory with ferroelectric capacitors is proposed and simulated. The architecture includes: (1) the operation procedure for DRAM-like memory cells with a Vcc/2 common plate, (2) commands and pin arrangement compatible with those of DRAMs. The resulting ferroelectric memory is expected to show, in addition to nonvolatility, high performance in terms of speed, active power dissipation, and read endurance. In addition, the memory can be handled in the same way as DRAMs. The proposed basic operations are confirmed by using circuit simulations, in which an equivalent circuit model for ferroelectirc capacitors is incorporated. A problem remaining with the architecture is low write endurance due to fatigue along with polarization switching. Designing the reference-voltage generator for 1T1C (one-transistor and one-capacitor) cells, while considering signal reduction along with fatigue, will be another issue for achieving high-density comparable to that of DRAMs.
Takashi KOUNO Gen SUZUKI Minaru NAKANO
We believe that virtual world communication will subsume BBS and visual communication. Accordingly, we proposed the networked virtual world "Interspace" for visual communication. If we are to achieve education and training in this world, techniques to receive and transmit information without any special training are necessary. The traditional "easy" ways of transmitting information are talking and drawing. In Interspace, users can already talk each other. In this paper we focus on drawing. In daily life we communicate through drawings in various situations. At this time it is important to recognize who is drawing and where the participants are watching. It is difficult to realize these functions using conventional media, but it is possible to realize them in virtual space. In virtual space, the system can clearly represent who is drawing and where participants are watching; expressing topics in virtual space frees us from many physical restrictions. In this paper we discuss the process of drawing when many participants share topics in virtual space; the necessary conditions for our system are considered. We design a system that offers functions to make drawing sheets, to display the view fields of participants, and to share visual fields. Furthermore, we propose the mode of InterSheet called "InterMirror" which shows mirror images of partners and their drawings. We make a prototype and evaluate it. The results indicate the synergistic effect of drawing with voice and the usefulness of drawing for communication in virtual space.
The use of existing metallic local line facilities is being studied for providing "video on demand (VOD)" services to residential subscribers across asymmetric digital subscriber lines (ADSL). ADSL carries a high-rate channel in the downstream direction from a central office (CO) to the subscriber, and a low-rate channel in both directions on an existing 2-wire pair. Audio and video signals are compressed by the moving picture experts group's standardized algorithms (MPEG 1 and MPEG 2), and delivered to the subscriber in the high-rate channel. Control (demand and response) signals are transceived in the low-rate channel. This paper presents the line length coverage of ADSL systems given the environment of NTT's local networks. The bit rates in the downstream and upstream directions are assumed to be 1.6-9.2Mbit/s and 24kbit/s, respectively. Two types of ADSL systems are considered: transceiving ADSL signals using the plain old telephone service (POTS) line or the basic rate access (BRA; 320 kbaud ping-pong transmission system) line on the same 2-wire pair. 16-QAM, 32-QAM and 64-QAM are compared as transmission schemes. Intra-system crosstalk interference (interference between identical transmission systems) and inter-system crosstalk interference (interference between different transmission systems) with the existing digital subscriber lines (DSL) are estimated. It is shown that the inter-system crosstalk interference with BRA is most stringent, and ADSL with 16-QAM yields the best performance in NTT's local networks. This paper concludes that realizing ADSL with 16-QAM can achieve channel capacities of up to 9.2Mbit/s for fiber-in-the-feeder (FITF) access systems, but the possibility of applying ADSL to direct access systems is remote except for a restricted short haul use. Some comparisons regarding American local networks are also described.
Tadaaki YAMAUCHI Koji TANAKA Kiyohiro FURUTANI Yoshikazu MOROOKA Hiroshi MIYAMOTO Hideyuki OZAKI
This paper proposes a fully self-timing data-bus (FSD) architecture which includes a dual data-bus driven by the read-out data itself and a complementary output differential (COD) amplifier. The proposed COD amplifier achieves a high voltage gain and a high speed data transfer with low power consumption. The read-out data is transmitted from the COD amplifier to the output terminal without the timing control caused by the fluctuation of the device parameters. Therefore the proposed FSD architecture eliminates the timing delay and achieves a timing-free data transfer even in DRAMs with a small signal level at the sense amplifier and the data line. Applying this architecture to a 64-Mb DRAM, a fast column address access time of 16 ns and a RAS access time of 32 ns have been achieved.
Concerning the complexity of tree drawing, the following result of Supowit and Reingold is known: the problem of minimum drawing binary trees under several constraints is NP-complete. There remain, however, many open problems. For example, is it still NP-complete if we eliminate some constraints from the above set? In this paper, we treat tree-structured diagrams. A tree-structured diagrm is a tree with variably sized rectangular nodes. We consider the layout problem of tree-structured diagrams on Z2 (the integral lattice). Our problems are different from that of Supowit and Reingold, even if our problems are limited to binary trees. In fact, our set of constraints and that of Supowit and Reingold are incomparable. We show that a problem is NP-complete under a certain set of constraints. Furthermore, we also show that another problem is still NP-complete, even if we delete a constraint concerning with the symmetry from the previous set of constraints. This constraint corresponds to one of the constraints of Supowit and Reingold, if the problem is limited to binary trees.
Takeshi HAMAMOTO Yutaka ISHIBASHI Masami AOKI Yoshihiko SAITOH Takashi YAMADA
NAND-structured trench capacitor cell technologies for 256 Mb DRAM and beyond have been developed. The NAND-structured cell has four memory cells connected in series. The cell size can be reduced to 56% of the conventional cell. A substrate plate trench capacitor cell was adapted to this layout. The NAND-structured trench capacitor cell can achieve sufficient storage capacitance within the restricted capacitor area. A sufficient capacitance of 40 fF was achieved when the size and depth of trench were 0.5 µm and 5.0 µm, respectively. The most important point for realizing the NAND-structured trench capacitor cell is how to reduce the leakage current from the storage node. There are two main sources; one is the leakage current to the neighboring cells, the other is the leakage current to Pwell. These leakage currents have been investigated. An experimental 256 Mb DRAM with the NAND-structured cell was fabricated using the 0.4 µm design rule. The chip size is 464 mm2, which is 68% of a conventional DRAM of the same design rule. This is the result of the reduction of the memory cell area by the NAND-structured cell and the introduction of the open-bit-line arrangement.
Yuji SAKAI Kanji OISHI Miki MATSUMOTO Shoji WADA Tadamichi SAKASHITA Masahiro KATAYAMA
As microprocessor units have become faster, DRAMs have also been required to become faster. One of the fast DRAMs is the synchronous DRAM, which transfers data at a high rate. We have developed a 100-MHz Synchronous DRAM using pipeline architecture and new high speed I/O lines method. This paper describes some features of the DRAM and its new pipeline architecture.
Katsumi SUIZU Toshiyuki OGAWA Kazuyasu FUJISHIMA
Ever increasing demand for higher bandwidth memories, which is fueled by multimedia and 3D graphics, seems to be somewhat satisfied with various emerging memory solutions. This paper gives a review of these emerging DRAM architectures and a performance comparison based on a condition to let the readers have some perspectives of the future and optimized graphics systems.
Yukihito OOWAKI Keiji MABUCHI Shigeyoshi WATANABE Kazunori OHUCHI Jun'ichi MATSUNAGA Fujio MASUOKA
This paper describes the new α-particle induced soft error mechanism, the Minority Carrier Outflow (MCO) effect, which may seriously affect the reliability of the scaled DRAMs with three dimensional capacitors. The MCO chargge increases as the device size miniaturizes because of the three dimensional capacitor effect as below. As the device scales down, the storage node volume decreases which results in the higher minority carrier density in the storage node and larger outflow charge. Also as the device plan view miniaturizes, the stack capacitor height or trench depth does not scales down or even increases to keep the storage node capacitance, therefore the initially generated minority carrier becomes larger. A simple analytical MCO model is introduced to evaluate the MCO effect quantitatively. The model agrees well with the three dimensional device simulation. The MCO model predicts that the life time of the minority carrier in the storage node strongly affects the MCO charge, however, even when the life time is as small as the order of 100 ps, the MCO effect can be the major soft error mechanism.
A bipolar low-voltage multiplier core is presented. The proposed low-voltage multiplier core is built from a bipolar quadritail cell. Voltages applied to the individual bases of the transistors in the bipolar quadritail cell are aVxbVy, (a1)Vx(b1)Vy ,aVx(b1)Vy, and (a1)VxbVy, where Vx and Vy are the input signals, and a and b are constants, for example, VxVy, O, Vx, and Vy. Simple input systems using resistive dividers are also described. The dc transfer characteristics were verified on a breadboard using transistor-arrays and discrete components. The dc transfer characteristic of the proposed multiplier core is very close to that of the Gilbert multiplier cell, but the proposed multiplier core is operable on low supply voltage. Therefore, a bipolar multiplier core using a quadritail cell is a low-voltage version of the Gilbert multiplier cell. The proposed bipolar multiplier is practically useful because it can be easily implemented in integrated circuits by utilizing a multiplier core and a resistor-only input system, and it also operates at very lowvoltage. Therefore, the proposed bipolar multipliers are very suitable for low-power operation.
Hidetoshi OGIHARA Masaki YOSHIMARU Shunji TAKASE Hiroki KUROGI Hiroyuki TAMURA Akio KITA Hiroshi ONODA Madayoshi INO
The Double-Sided Rugged poly Si (DSR) technology has been developed for high density DRAMs. The DSR technology was achieved using transformation of rugged poly Si caused by ion implantation. The DSR can increase the surface area of the storage electrode, because it has rugged surfaces on both upper and lower sides. The 2-FINs STC (STacked Capacitor cell) with DSR was fabricated in the cell size of 0.72 µm2, and it is confirmed that the DSR can increase the surface area 1.8 times larger than that of smooth poly Si. It is expected that 25 fF/bit is obtained with a 300 nm-thick storage electrode. These effects show that sufficient capacitance for 256 Mb DRAMs is obtained with a low storage electrode. It is confirmed that there is no degradation in C-V and I-V characteristics. Moreover, the DSR needs neither complicated process steps nor special technologies. Therefore, the DSR technology is one of the most suitable methods for 256 Mb DRAMs and beyond.
Takaaki YAGI You-Wen YI Mitsuchika SAITOH Nobuo MIKOSHIBA
A novel effective channel length extraction method has been developed, which utilizes the difference between the local threshold voltage of channel region and that of external region. In this method, the dependence of external resistance on Vg is taken into account, and it is not necessary to extract Vth. It is found that the external resistance can be approximated as the linear function of Vg with Vg around Vth. For a 0.4 µm gate length LDD MOSFET, the accuracy and resolution are estimated to be less than 0.02 µm and 0.003 µm, respectively.
Takao WATANABE Kazushige AYUKAWA Yoshinobu NAKAGOME
A single-chip architecture for three-dimensional (3-D) computer graphics (CG) is discussed assuming portable equipment with a 3-D CG interface. Based on a discussion of chip requirements, an architecture utilizing DRAM technology is proposed. A 31-Mbit, on-chip DRAM cell array allows a full-color, 480640-pixel frame with two 3-D frame buffers for double buffering and one 2-D frame buffer for superimposed or background images. The on-chip pixel generator produces R, G, B, and Z data in a triangular polygon with a zigzag-scan interpolation algorithm. The on-chip frame synthesizer combines data from one of the 3-D buffers with that from the 2-D buffer to produce superimposed or background 2-D images within a 3-D CG image. Parallel alpha-blending and Z-comparison circuits attached to the DRAM cell array provide a high data I/O rate. Estimation of the chip performance assuming the 0.35-µm CMOS design rule shows the chip size, the drawing speed, on-chip data I/O rate, and power dissipation would be 1413.5-mm, 0.25 million polygons/s, 1 gigabyte/s, and 590 mW at a voltage of 3.3 V, respectively. Based on circuit simulations, the chip can run on a 1.5-V dry cell with a drawing speed of 0.125 million polygons/s and a power dissipation of 61 mW. A scaled-down version of the chip which has an 1-kbit DRAM cell array with an attached alpha-blending circuit is being fabricated for evaluation.
A globally and quadratically convergent algorithm is presented for solving nonlinear resistive networks containing transistors modeled by the Gummel-Poon model or the Shichman-Hodges model. This algorithm is based on the Katzenelson algorithm that is globally convergent for a broad class of piecewise-linear resistive networks. An effective restart technique is introduced, by which the algorithm converges to the solutions of the nonlinear resistive networks quadratically. The quadratic convergence is proved and also verified by numerical examples.